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On the influence of dilute charged impurity and perpendicular electric field on the electronic phase of phosphorene: Band gap engineering
摘要： Tuning the band gap plays an important role for applicability of 2D materials in the semiconductor industry. The present paper is a theoretical study on the band gap engineering using the electronic density of states (DOS) of phosphorene in the presence of dilute charged impurity and of a perpendicular electric field. The electronic DOS is numerically calculated using a combination of the continuum model Hamiltonian and the Green’s function approach. Our findings show that the band gap of phosphorene in the absence and presence of the perpendicular electric field decreases with increasing impurity concentration and/or impurity scattering potential. Further, we found that in the presence of opposite perpendicular electric fields, the electronic DOS of disordered phosphorene shows different changing behaviors stemming from the Stark effect: in the positive case the band gap increases with increasing electric-field strength; whereas in the negative case the band gap disappears. The latter, in turn, leads to the semiconductor-to-semimetal and semiconductor-to-metal phase transition for the case of strong impurity concentrations and strong impurity scattering potentials, respectively. The results can serve as a base for future applications in logic electronic devices.
关键词： Stark effect,perpendicular electric field,semiconductor-to-semimetal transition,phosphorene,band gap engineering,electronic density of states,semiconductor-to-metal transition,dilute charged impurity
更新于2025-09-10 09:29:36
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Growth without Postannealing of Monoclinic VO2 Thin Film by Atomic Layer Deposition Using VCl4 as Precursor
摘要： Vanadium dioxide (VO2) is a multifunctional material with semiconductor-to-metal transition (SMT) property. Organic vanadium compounds are usually employed as ALD precursors to grow VO2 films. However, the as-deposited films are reported to have amorphous structure with no significant SMT property, therefore a postannealing process is necessary for converting the amorphous VO2 to crystalline VO2. In this study, an inorganic vanadium tetrachloride (VCl4) is used as an ALD precursor for the first time to grow VO2 films. The VO2 film is directly crystallized and grown on the substrate without any postannealing process. The VO2 film displays significant SMT behavior, which is verified by temperature-dependent Raman spectrometer and four-point-probing system. The results demonstrate that the VCl4 is suitably employed as a new ALD precursor to grow crystallized VO2 films. It can be reasonably imagined that the VCl4 can also be used to grow various directly crystallized vanadium oxides by controlling the ALD-process parameters.
关键词： vanadium tetrachloride,vanadium oxide,atomic layer deposition,semiconductor-to-metal transition,vanadium dioxide
更新于2025-09-09 09:28:46