Dual-Wavelength (UV and Blue) Controlled Photopolymerization Confinement for 3D-Printing: Modeling and Analysis of Measurements

摘要： The kinetics and modeling of dual-wavelength (UV and blue) controlled photopolymerization con?nement (PC) are presented and measured data are analyzed by analytic formulas and numerical data. The UV-light initiated inhibition e?ect is strongly monomer-dependent due to di?erent C=C bond rate constants and conversion e?cacies. Without the UV-light, for a given blue-light intensity, higher initiator concentration (C10) and rate constant (k’) lead to higher conversion, as also predicted by analytic formulas, in which the total conversion rate (RT) is an increasing function of C1 and k’R, which is proportional to k’[gB1C1]0.5. However, the coupling factor B1 plays a di?erent role that higher B1 leads to higher conversion only in the transient regime; whereas higher B1 leads to lower steady-state conversion. For a ?xed initiator concentration C10, higher inhibitor concentration (C20) leads to lower conversion due to a stronger inhibition e?ect. However, same conversion ? b2C20]. Conversion of blue-only are much higher than that of UV-only and UV-blue combined, in which high C20 results a strong reduction of blue-only-conversion, such that the UV-light serves as the turn-o? (trigger) mechanism for the purpose of spatial con?rmation within the overlap area of UV and blue light. For example, UV-light controlled methacrylate conversion of a glycidyl dimethacrylate resin is formulated with a tertiary amine co-initiator, and butyl nitrite. The system is subject to a continuous exposure of a blue light, but an on-o? exposure of a UV-light. Finally, we developed a theoretical new ?nding for the criterion of a good material/candidate governed by a double ratio of light-intensity and concentration, [I20C20]/[I10C10].