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Stretchable and Higha??Adhesive Plasmonic Metasheet Using Al Subwavelength Grating Embedded in an Elastomer Nanosheet
摘要： Plasmonic metasurfaces have attracted much attention for use in device applications over the past decade. Dynamic color tuning (DCT), where the displacement of periodic nanostructures is controlled to generate different colors in real time, is one of the great possibilities of plasmonic metasurfaces for optical strain sensors or display devices. In this study, an Al metasurface embedded in an elastomer nanosheet with film thickness 400 nm is fabricated by means of sacrificial release using a polyvinyl alcohol sacrificial layer. This plasmonic metasheet shows not only the seven colors produced by surface plasmons, but also DCT by stretching the elastomer nanosheet. Each pixel, designed with a grating period of 300–600 nm, emits the bright colors expected in electromagnetic simulation. Moreover, stretching the plasmonic metasheet demonstrates DCT from 495 to 660 nm in the visible light range. The freestanding metasheet with maximum thickness 400 nm may be easily integrated into any active device by post-processing transfer. Stretching the metasheet requires an estimated × 10?3 lower force than previously reported for plasmonic metasurfaces, owing to a film thickness of only several hundreds of nanometers. These results facilitate the realization of microdevices with novel capabilities based on plasmonic metamaterials.
关键词： plasmonic metamaterials,elastomer nanosheets,dynamic color tuning,subwavelength gratings,surface plasmons
更新于2025-09-23 15:21:01
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Pancharatnam–Berry Optical Elements for Spin and Orbital Angular Momentum Division Demultiplexing
摘要： A Pancharatnam–Berry optical element is designed, fabricated, and optically characterized for the demultiplexing of beams with different polarization and orbital angular momentum states at the telecom wavelength of 1310 nm. The geometric phase control is achieved by fabricating properly-oriented subwavelength gratings on a silicon substrate, inducing a spatially-variant form birefringence. The digital grating pattern is transferred to the silicon substrate with a two-step nanofabrication protocol, using inductively coupled plasma reactive ion etching to transfer the resist pattern generated with high-resolution electron beam lithography. The optical characterization of the sample confirms the expected capability to sort circularly polarized optical beams with different handedness and orbital angular momentum. Encompassing optical element design and silicon photonics, the designed silicon metasurface paves the way to innovative devices for total angular momentum mode division multiplexing with unprecedented levels of integration.
关键词： subwavelength gratings,electron beam lithography,metasurfaces,silicon,orbital angular momentum,reactive ion etching,mode division multiplexing,polarization division multiplexing,Pancharatnam–Berry optical elements
更新于2025-09-10 09:29:36