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Physical Vapor Deposited Films of a Perylene Derivative: Supramolecular Arrangement and Thermal Stability
摘要： The analysis of supramolecular arrangement is essential to understand the role of this key factor on the optical and electrical properties of organic thin films. In this work, thin solid films of bis(phenethylimido) perylene (PhPTCD) fabricated using physical vapor deposition (PVD) technique (thermal evaporation), deposited simultaneously onto different substrates (Ag mirror, Ge, and quartz plates) contingent on the characterization technique. The main objective is to study the PhPTCD supramolecular arrangement and the thermal stability of this arrangement in PVD films. The ultraviolet-visible absorption reveals a controlled growth of the PVD films, and the micro-Raman scattering data show that the PhPTCD molecule is not thermally degraded in the conditions of these experiments. The microscopy also shows a homogeneous morphological surface of the PVD film at macro and micro scales, with molecular aggregates at nanoscale. Besides, the PVD film roughness does not follow substrate roughness. The X-ray diffraction indicates a crystalline structure for PhPTCD powder and an amorphous form for PhPTCD PVD film. The infrared absorption spectroscopy points to a preferential flat-on organization of the molecules in the PVD films. In addition, the annealing process (200 oC for 20 minutes) does not affect the supramolecular arrangement of the PhPTCD PVD films.
关键词： perylene,PVD nanostructured films,thermal treatment,supramolecular arrangement
更新于2025-09-09 09:28:46
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Multi-electron reduction of Wells–Dawson polyoxometalate films onto metallic, semiconducting and dielectric substrates
摘要： The investigation of conditions allowing multi-electron reduction and reoxidation of polyoxometalate (POM) films onto solid substrates is considered an issue of critical importance for their successful incorporation in electronic devices, different types of sensors and catalytic systems. In the present paper, the rich multi-electron redox chemistry of films of Wells–Dawson ammonium salts, namely (NH4)6P2Mo18O62 and (NH4)6P2W18O62, on top of metallic (Al), semiconducting (ITO) and dielectric (SiO2) substrates under ambient conditions is investigated. The respective Keggin heteropolyacids, H3PMo12O40 and H3PW12O40, are also investigated for comparison. On Al substrates, the Wells–Dawson ammonium salts are found to be significantly more reduced (4–6e?) compared to the respective Keggin heteropolyacids (≤2e?), in accordance with their deeper lying lowest unoccupied molecular orbital (LUMO) level. Subsequent thermal treatment in air results in reoxidation of the initially highly reduced POM films. Similar behavior is found on ITO substrates, but in initially less reduced (2–4e?) Wells–Dawson POM films. On the other hand, on SiO2 substrates, the thermal reduction of (NH4)6P2Mo18O62 film is observed and attributed to the thermal oxidation of ammonium counterions by [P2Mo18O62]6? anions. Overall, the multi-electron reduction of Wells–Dawson ammonium salts onto metallic and semiconducting substrates (Al, ITO) is determined by the relative position of the LUMO level of POMs in relation to the Fermi level of the substrate (i.e. substrate work function) and affected in a synergistic way by the presence of ammonium counterions. In contrast, on dielectric substrates (SiO2) the reduction of Wells–Dawson POMs ((NH4)6P2Mo18O62) is attributed only to the oxidation of ammonium counterions.
关键词： Polyoxometalates,Semiconducting substrates,Ammonium counterions,Wells–Dawson ammonium salts,Redox chemistry,Keggin heteropolyacids,Metallic substrates,Dielectric substrates,Thermal treatment,Multi-electron reduction
更新于2025-09-04 15:30:14