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Optical Sectioning Microscopy For Multilayer Structure With Micro-Scale Air Gaps Measurement
摘要： In this letter, we propose a new method based on the optical sectioning microscopy to characterize the multilayer structure with micro-scale air gaps. With this technique, sinusoidal fringe patterns having a predefined shifted phase produced by digital micro-mirror devices are illuminated onto the sample. The contrast response curve (CRC) of the reflected patterns along the scanning direction is determined by the phase-shifting algorithm while the object is scanned through the focus of the microscope. The maximum contrast value of the CRC occurs at the position where the sample is on the focal plane. The peak positions of the CRC are extracted through the Gaussian fitting and then implemented to achieve the surface topography and gap thickness distribution. To suppress the noise influence caused by the environment fluctuations or other factors, the frequency domain analysis (FDA) has been introduced in this work. The simulations and experiments are conducted to verify the feasibility of this technique, demonstrating the potential to be applied in such fields as semiconductor and biochip, where the air gap may play crucial roles.
关键词： thickness measurement,microscopy,surface topography
更新于2025-09-04 15:30:14
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Materials Science and Technology of Optical Fabrication || Surface Roughness
摘要： Because it influences optical-scatter losses and downstream laser modulation [1], the surface roughness of an optical-glass component is an important parameter for many optical systems (including lasers and telescopes). During optical polishing, a number of interactions between the workpiece, polishing slurry, and pad may influence the resulting workpiece roughness at different spatial scale lengths. The phenomena affecting large spatial scale length (>1 mm) on the workpiece (i.e. surface figure) are described in Chapter 2 (see Figure 2.1). By contrast, in this chapter, the phenomena and process parameters affecting short spatial scale lengths (<1 mm) (i.e., surface roughness from AFM2 scale roughness to μ-roughness) are described (see Figure 1.8). Fine-scale roughness, typically measured by atomic force microscopy (AFM), is referred to as AFM1 (≤5 μm) and AFM2 roughness (≤50 μm), as represented on the right of the plot. Roughness at this scale is influenced by parameters such as the single-particle removal function, Beilby layer properties, slurry particle size distribution (PSD), pad topography, pad mechanical properties, and slurry particle redeposition. The next higher spatial scale length (the micrometer to millimeter range, known as micro- or μ-roughness), is usually measured by white-light interferometry (Figure 1.8). μ-Roughness is affected not only by the smaller spatial-scale length phenomena given above, but also by factors governing slurry-interface interactions, such as the spatial distribution of slurry particles present at the interface. These parameters and phenomena are listed Figure 4.1, consisting of a schematic of the workpiece–lap interface at the spatial scale length of interest that influences the final polished surface roughness. Figure 4.1 provides a valuable outline for this chapter.
关键词： Optical Polishing,Slurry PSD,Pad Topography,AFM,μ-Roughness,Surface Roughness
更新于2025-09-04 15:30:14