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Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films
摘要： Metastable titanium aluminum nitride coatings are widely applied in cutting and forming applications. Although it is generally accepted that the phase formation of metastable TiAlN is governed by kinetic factors, modeling attempts today are based solely on energetics. In this work, the metastable phase formation of TiAlN is predicted based on one combinatorial magnetron sputtering experiment, the activation energy for surface diffusion, the critical diffusion distance, as well as thermodynamic calculations. The phase formation data obtained from further combinatorial growth experiments varying chemical composition, deposition temperature, and deposition rate are in good agreement with the model. Furthermore, it is demonstrated that a significant extension of the predicted critical solubility range is enabled by taking kinetic factors into account. Explicit consideration of kinetics extends the Al solubility limit to lower values, previously unobtainable by energetics, but accessible experimentally.
关键词： Surface diffusion,TiAlN,Metastable phase,Combinatorial magnetron sputtering
更新于2025-09-04 15:30:14
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Cr/C Reflective Multilayer for Wavelength of 44.8 ?
摘要： The working wavelength of Ni-like, Ta soft X-ray laser is 44.8 ?, just near the “water window.” High re?ection multilayers are required for this kind of laser in China. In this work, we design and fabricate carbon-based multilayer re?ective samples. The Cr/C multilayer was selected from proposed candidates such as Co/C, Ni/C, and CoCr/C material combinations. The period thickness is only 22.6 ?. Cr/C multilayers were deposited by the magnetron sputtering method. Multilayers with bi-layer numbers of 150, 200, 250 and 300 were deposited onto super polished silicon wafers. All multilayers have been characterized by grazing incidence X-ray re?ectance (GIXRR). Then, near-normal incidence re?ectance measurements were performed at beamline 3W1B, Beijing synchrotron radiation (BSRF). The highest re?ectance of 13.2% is achieved with the bi-layer number of 300. Transmission electron microscopy measurements also clearly show the sharp Cr–C interfaces in the multilayer.
关键词： Multilayer,Soft X-ray Laser,Re?ectance,Magnetron Sputtering,Synchrotron Radiation
更新于2025-09-04 15:30:14
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Room-temperature RF magnetron sputtering deposition of hydrogenated Ga-doped ZnO thin films on PET substrates for PDLC devices
摘要： In this work, hydrogenated gallium-doped zinc oxide (HGZO) thin films were deposited on polyethylene terephthalate substrates at room temperature by RF magnetron sputtering. The effects of RF power and Ar + H2 flow rate on electrical and optical properties of HGZO thin films were investigated systematically. All of HGZO thin films exhibited a high average transmittance of about 77.3–82.9% in the visible range, and the minimum resistivity value reached 7.1 × 10?4 ?·cm. Potential application of polymer-dispersed liquid crystal device based on HGZO thin film was also successfully demonstrated.
关键词： RF magnetron sputtering,HGZO thin films,PDLC devices,PET substrates
更新于2025-09-04 15:30:14
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Highly Transparent Conducting Indium Tin Oxide Thin Films Prepared by Radio Frequency Magnetron Sputtering and Thermal Annealing
摘要： High-quality ITO (indium tin oxide) films were grown by radio frequency (RF) magnetron sputtering and post thermal annealing. Both the thermal annealing temperature and the atmosphere significantly influenced the optical and electrical properties of ITO films. The as-grown 110-nm-thick ITO film showed an optical transmittance of 34.2% at a wavelength of 550 nm and electrical resistivity of 9.2 × 10?4 Ωcm. Notably, the ITO films annealed at 850 °C for 1 min in nitrogen ambient led to a significantly improved optical transmittance (97.3%) and the low electrical resistivity of 1.3 × 10?4 Ωcm, while those annealed in air or oxygen ambient produced poorer electrical properties despite their good optical transmittance owing to the presence of oxygen. The high quality of the ITO film annealed in nitrogen could be attributed to the combined effects of effective suppression of oxygen incorporation into films (thus maintaining oxygen vacancies in the ITO film), enhanced Sn doping, and improved the crystallinity with larger grain size.
关键词： ITO,RF-Magnetron Sputtering,Optical Transmittance,Rapid Thermal Annealing
更新于2025-09-04 15:30:14
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Deposition of Amorphous Carbon Thin Films by RF Magnetron Sputtering using Woodceramics as Target
摘要： Woodceramics, a substance based on woody materials carbonized at elevated temperatures after impregnating with phenolic resin, have been developed as a new kind of porous carbonaceous material. To expand the industrial application, we attempted to produce amorphous carbon films were RF magnetron sputtering using woodceramics as its target. As a result, typical amorphous carbon films were successfully produced using woodceramics, and the films were characterized by X-ray diffractometry, Raman spectroscopy and X-ray photoelectron spectroscopy. The films produced were composed of carbon turbostratic structure or amorphous whose electron configurations consisted of sp2 and sp3. The ratio of sp3 bonding in the films were about 53% just after the sputtering, but the number increased to about 82% after etching the material using argon ions. Fundamental mechanical properties such as hardness and friction coefficient were also measured and taken into account.
关键词： magnetron sputtering,Raman spectroscopy,X-ray photoelectron spectroscopy,amorphous carbon film,woodceramics
更新于2025-09-04 15:30:14
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Preparation of monolayer hollow spherical tungsten oxide films with enhanced near infrared electrochromic performances
摘要： In this study, monolayer hollow spherical tungsten oxide (WO3) films have been prepared for the first time by magnetron sputtering combined with the colloidal crystal template method. Due to the large specific surface area, short ion diffusion distances, and weak scattering of the monolayer hollow structure, the hollow spherical WO3 film exhibits excellent electrochromic performance. This includes high transmittance modulation in the near-infrared spectral range (78.8% at l ? 1000 nm), fast switching (cid:2)1) response time (2.41 s for coloration and 1.28 s for bleaching), and high coloring efficiency (102.9 cm2 C at 1000 nm. The results show that the hollow spherical WO3 film can effectively regulate incident light, especially in the near infrared band, which is not visible but has significant thermal effects.
关键词： Electrochromics,Hollow spherical tungsten oxide,Colloidal crystal template,Magnetron sputtering
更新于2025-09-04 15:30:14
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Energy-enhanced deposition of copper thin films by bipolar high power impulse magnetron sputtering
摘要： Bipolar Pulse High Power Impulse Magnetron Sputtering (BP-HiPIMS) was investigated and used in this work to control the ion bombardment process of growing thin films and to improve their structure and properties. Energy-resolving mass spectroscopy was used to investigate the effect of reverse target voltage on the ion energies and fluxes during BP-HiPIMS of a high-purity copper target, in argon gas. It was found that the reverse target voltage provides a wide range of ion energies and fluxes incident to the growing film, which, in turn, produce a wide variety of effects during the deposition process, improving the adhesion strength and influencing both surface and bulk properties. Fast ICCD imaging was used to investigate both HiPIMS and BP-HiPIMS plasma dynamics. The temporal and spatial distributions of plasma potential measurements were performed in order to explain the mechanisms for accelerating the ions. The topological, structural and mechanical properties of the deposited coatings were investigated using atomic force microscopy (AFM), X-ray diffraction (XRD), Rutherford backscattering spectrometry (RBS), thermal desorption spectroscopy (TDS), scanning electron microscopy (SEM), nanoindentation and scratch tests. The obtained results indicate an energy-enhanced deposition process during BP-HiPIMS, the deposited films being characterized by smooth surfaces, dense microstructure, small inert gas inclusions, high elastic strain to failure, scratch resistance and good adhesion to the substrate. These improvements in the films’ structure and properties may be attributed to the intense and energetic ion bombardment taking place during the deposition process. During BP-HiPIMS operation, there is no net increase in the deposition rate as compared to the monopolar regime due to the re-sputtering process.
关键词： Bipolar Pulse High Power Impulse Magnetron Sputtering (BP-HiPIMS),Tribology,Fast ICCD imaging,Ion energy distributions (IED)
更新于2025-09-04 15:30:14
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[IEEE 2018 19th International Conference on Electronic Packaging Technology (ICEPT) - Shanghai (2018.8.8-2018.8.11)] 2018 19th International Conference on Electronic Packaging Technology (ICEPT) - Wafer-level integration of micro heaters on an alkali vapor cell for chip-scale atomic magnetometers
摘要： Wafer-level integration of micro heater on an alkali vapor cell is presented. In order to obtain a suitable resistivity, polysilicon and aluminum are mixed as the target material. Magnetron sputtering is adopted to fabricate the heater on the surface of the alkali vapor cell. Various voltages are applied to the heater, of which the temperatures are measured by thermal sensitive (SERF) atomic sensors. Spin exchange relaxation free magnetometer with the heater integrated on the alkali vapor cell is characterized. Results show that the micro heater is successfully integrated on the alkali vapor cell. With the integrated heater, the rubidium vapor cell is heated up to 120℃ by a 445kHz AC current. The sensitivity of the SERF magnetometer is 6.3pT/Hz1/2. Results also indicate that it provides an effective and low-cost solution for miniaturization of atomic magnetometers.
关键词： SERF magnetometer,polysilicon-aluminum,magnetron sputtering,heater
更新于2025-09-04 15:30:14
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Effect of microstructural changes in the biological behavior of magnetron sputtered ZnO thin films
摘要： This work is focused on the evaluation of the correlation between the microstructural changes of zinc oxide (ZnO) thin films and its biological behavior. For this study, ZnO thin films were prepared by reactive magnetron sputtering, using different deposition times and reactive gas (O2) flows, and tested against a fungal pathogenic species, Candida albicans. Results showed that the increase of thickness of the films did not affect significantly the surface roughness but changed the crystalline structure of the films (ZnO in the hcp structure), which was followed by a small increase of antifungal properties, leading to a decrease of viable cells. The decrease of O2 flow in the deposition chamber affected the roughness only slightly (roughly 1 nm difference between the different films) but resulted in a clear decrease in the crystallinity of thin films, which improved even further their antifungal activity. These results seem to indicate a correlation between structural features and the antifungal behavior of the ZnO thin films, which will be shown by different analyses. When tested against the fungal species, the films showed to be capable of reducing the growth rate and inhibit their growth, leading to a low number of microbial cells at the end of the experiment. A deeper analysis by flow cytometry on how the thin films affected the microbial cells showed a reduced global enzymatic activity in yeast cells after contact with the materials’ surface.
关键词： antifungal properties,magnetron sputtering,ZnO thin films,microstructural changes,biological behavior
更新于2025-09-04 15:30:14
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Investigation of gas discharge features during HiPIMS using optical emission spectroscopy
摘要： The paper presents the results of the investigation of the emission spectra of a gas discharge during high-power impulse magnetron sputtering (HiPIMS) of a titanium target at different power supply parameters. In such mode, the fraction of ionized atoms of the target material in the discharge increases significantly, what affects the properties of the deposited coatings. The characteristic features of the operation of the system in HiPIMS mode were singled out, and also the discharge spectra were compared at high-power impulse and conventional (sputtering on a direct current) operation modes of the magnetron. As a result of the study, it was shown that the use of optical emission spectroscopy during HiPIMS makes it possible to effectively determine the parameters of the stable operation of the system and determine the boundary at which a transition into high-power regime occurs.
关键词： titanium target,HiPIMS,gas discharge,magnetron sputtering,optical emission spectroscopy
更新于2025-09-04 15:30:14