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High-quality Concentrated Precursor Solution in N,N-dimethylformamide for Thick Methylammonium Triiodoplumbate Layer in Solar Cells
摘要： High-quality precursor solution is essential for the fabrication of hybrid perovskite solar cells. This paper reports a simple and efficient method of preparing the high-quality concentrated solution of methylammonium triiodoplumbate (MAPbI3) in N,N-dimethyl formamide (DMF) by using MAPbI3 crystal instead of conventional lead iodine and methylammonium iodine blend. The MAPbI3 concentration of the precursor solution is easily and accurately adjusted from zero up to 1.64 M. The investigation on the dissolution process of the MAPbI3 crystal reveals that the concentrated solution of MAPbI3 in DMF is metastable, and transition from the concentrated solution to solvated intermediate MAPbI3?DMF determines the solubility of MAPbI3 in DMF. The high purity and precise stoichiometric ratio of the crystal eliminate the possible impurities that initialize the transition to MAPbI3?DMF, and consequently suppress the transition and increase the stability of the concentrated solution. MAPbI3 films with different thickness up to 800 nm are prepared with conventional film fabrication technique, and a highest power conversion efficiency of 20.7% is achieved on corresponding solar cells. The newly developed method to prepare the concentrated precursor solution can be easily combined with other fabrication techniques for the further development of industrial-scale manufacture of solar cells.
关键词： dissolution kinetics,methylammonium triiodoplumbate,solubility,crystal
更新于2025-09-23 15:21:01
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Relationship between C=C double bond conversion and dissolution kinetics in cross-linking-type photoresists for display manufacture, studied by real-time Fourier transform infrared spectroscopy and quartz crystal microbalance methods
摘要： Photoresists are an indispensable technology used for manufacturing electronic devices such as displays and semiconductors. In this study, we investigated the relationship between C=C double bond conversion and dissolution kinetics in cross-linking-type photoresists used for display manufacture using real-time Fourier transform infrared spectroscopy (FTIR) and quartz crystal microbalance (QCM) methods. To improve photoresist performance, it is important to understand the development mechanism of photoresists. Two kinds of polymers (a polymer with peeling-type dissolution and a polymer with a dissolution type with Case II diffusion) were used. 1,2-Octanedione-1-[4-(phenylthio)-2-(O-benzoyloxime)] and bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide were used as photoinitiators. The dissolution was of the peeling type when the polymers were formulated as a typical cross-linking-type photoresist. With increasing conversion ratio of C=C double bonds, the rate of developer intake decreased and the impregnation threshold before the onset of peeling increased and then decreased. It was also found that the dissolution kinetics were affected by the radicals generated upon the decomposition of photoinitiators.
关键词： C=C double bond conversion,dissolution kinetics,quartz crystal microbalance,Photoresists,real-time Fourier transform infrared spectroscopy
更新于2025-09-04 15:30:14