ELECTRODELESS MEASUREMENT TECHNIQUE OF COMPLEX DIELECTRIC PERMITTIVITY OF HIGH-K DIELECTRIC FILMS IN THE MILLIMETER WAVELENGTH RANGE

摘要： An electrodeless measurement technique of complex dielectric permittivity of high-K dielectric ?lms is described. The technique is based on a quasi-optic Fabry-Perot resonator and modi?ed for investigation of two-layer dielectric structures — substrate/K-?lm. This procedure is destined to be used for providing a simple intermediate control of parameters of high-K ?lms before the following technological process. Regimes of measurements providing the most sensitive conditions for de?nition of ?lm parameters are considered. The proposed method is tested on two-layer structures with well-known parameters and is used for characterization of ferroelectric (Ba,Sr)TiO3 ?lms in the millimeter wavelength range (～ 50 GHz).