研究目的
To describe an electrodeless measurement technique for determining the complex dielectric permittivity of high-K dielectric films in the millimeter wavelength range, using a quasi-optic Fabry-Perot resonator.
研究成果
The developed technique based on the quasi-optical Fabry-Perot resonator provides accurate measurements of the dielectric constant and dielectric loss tangent of high-K films in the mm-wave frequency range. It is suitable for both laboratory study and fast control measurements in serial production.
研究不足
The main source of errors is connected with the correct definition of the film inclusion coefficient. For thin films with low permittivity, the relative errors can be up to 5% for permittivity and 10% for losses.
1：Experimental Design and Method Selection:
The technique is based on a quasi-optic Fabry-Perot resonator, modified for investigating two-layer dielectric structures (substrate/K-film).
2：Sample Selection and Data Sources:
Two-layer structures with known parameters (SiO2, LaAlO3, Al2O3) and ferroelectric (Ba,Sr)TiO3 films were used.
3：List of Experimental Equipment and Materials:
Open resonator with plane mirror diameter 120 mm, diameter aperture of concave mirror 200 mm, and its curvature of 139 mm.
4：Experimental Procedures and Operational Workflow:
The sample is placed on the flat mirror, and the resonance frequency shift is compensated by moving the plane mirror.
5：Data Analysis Methods:
The relationship between resonance frequency and permittivity of the film is obtained using boundary condition equations and impedance transformation approach.
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