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Gas Breakdown and Discharge Formation in High-Power Impulse Magnetron Sputtering
摘要： Discharge behaviors of high-power impulse magnetron sputtering with different targets have been investigated. Distinct current–voltage curves and target current waveforms are observed. Breakdown voltage and the maximum target current show a periodic drop with the increase of atomic number in subgroups and periods. The target current density is found to be mainly affected by the secondary electron emission yield. Thus, its magnitude is unable to directly evaluate the ionization degree of sputtered atoms in high-power impulse magnetron sputtering (HiPIMS) process. In this paper, the interactive influence of secondary electron emission, sputter yield, and ionization energy on the ionization degree of sputtered atoms is discussed based on the analysis of the voltage and current characteristics. As a result, targets can be categorized into three sorts according to the ionization degree: 1) low ionization degree targets, such as Ag and C less than 10%; 2) intermediate ionization degree targets like Cr and Cu with 55% and 35%; 3) Ti, Zr, and Mo targets with the second ionization processes. These results provide institutive operation ranges for the state-of-the-art HiPIMS applications.
关键词： optical emission spectroscopy (OES),ionization degree,Current waveform,gas breakdown,high-power impulse magnetron sputtering (HiPIMS)
更新于2025-09-23 15:22:29
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Temporal evolution of spatial optical emission characteristics by inductively-coupled impulse sputtering (ICIS) using high power-burst 155kHz-ICP
摘要： A copper target was negatively-biased and was sputtered by bombardment of argon ion species produced 155 kHz-inductively-coupled plasma (ICP) in a burst-pulse mode for a duration of 800 μs. This system was called ICIS (Inductively-coupled impulse sputtering). The plasma density was on the order of 1019 m-3 in the ICP region. The target current density and the power density were about 0.8 A/cm2 and about 0.3 kW/cm2, respectively. Temporal evolution of the optical emission of the plasma species was discussed. The observed species were argon ions, excited argon and excited copper. The entire region consisted of the ICP, a bulk plasma and a target plasma. Argon ions produced in the ICP were transported by an ambipolar diffusion toward the target and excited argon and excited copper species were mainly produced in the target plasma. A plateau emission by argon ions and spike emission by energetic electrons which were originated from secondary electrons were seen. Gas rarefaction of argon gas also influenced the temporary evolution particularly near at the target. This was discussed using a carbon target.
关键词： Inductively-coupled impulse sputtering,glow discharge,Inductively-coupled plasma,High power impulse magnetron sputtering,HiPIMS,ICIS
更新于2025-09-23 15:19:57