研究目的
Investigating the discharge behaviors, including gas breakdown, current-voltage characteristics, and ionization degree of sputtered atoms, in high-power impulse magnetron sputtering with different target materials to understand the interactive influences and provide operation ranges for applications.
研究成果
The discharge behaviors in HiPIMS vary significantly with target material, influenced by work function, secondary electron emission yield, sputter yield, and ionization energy. Targets are categorized into three groups based on ionization degree, with implications for deposition rate and stability. Results offer practical guidance for optimizing HiPIMS applications in thin film and coating technologies, suggesting further exploration for other materials and conditions.
研究不足
The OES data provide only qualitative information on HiPIMS discharge. The study does not consider ferromagnetic materials like Fe, Co, and Ni. The ionization degree calculations assume certain simplifications, such as neglecting second ionization processes in some cases, which may affect accuracy.
1：Experimental Design and Method Selection:
The study investigates HiPIMS discharge with various targets (Ag, Cu, Cr, Mo, Zr, Ti, C) under controlled conditions. Methods include analysis of current-voltage curves, target current waveforms, and optical emission spectroscopy (OES). Theoretical models for secondary electron emission, sputter yield, and ionization are employed.
2：Sample Selection and Data Sources:
Targets used are of 99.9% purity with dimensions 40 cm × 10 cm × 0.7 cm. Data on sputter yields are calculated using SRIM software. OES data are collected from plasma regions.
3：9% purity with dimensions 40 cm × 10 cm × 7 cm. Data on sputter yields are calculated using SRIM software. OES data are collected from plasma regions.
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: Equipment includes a HiPIMS system with a pulse unit (HPPMS-20k, PTL), cylindrical chamber (60 cm diameter, 60 cm height), OES system (Acton SpectraPro SP-2500, Princeton Instruments), and targets (Ag, Cu, Cr, Mo, Zr, Ti, C). Materials include research grade Ar gas (99.999%).
4：999%).
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Background pressure is pumped to 1.5×10^{-2} mTorr; working pressure is set at 3.8 mTorr with Ar flow of 50 sccm. Pulsewidth is 200 μs, frequency is 50 Hz. Pulse voltage is varied, and target current, voltage, and OES spectra are measured. Data are analyzed for breakdown voltage, arcing voltage, current waveforms, and ionization degree.
5：5×10^{-2} mTorr; working pressure is set at 8 mTorr with Ar flow of 50 sccm. Pulsewidth is 200 μs, frequency is 50 Hz. Pulse voltage is varied, and target current, voltage, and OES spectra are measured. Data are analyzed for breakdown voltage, arcing voltage, current waveforms, and ionization degree.
Data Analysis Methods:
5. Data Analysis Methods: Data analysis involves calculating average target current, secondary electron emission yield using equations, and ionization degree from models. Statistical analysis of current waveforms and OES data is performed to categorize targets based on ionization degree.
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