[IEEE 2018 International Semiconductor Conference (CAS) - Sinaia, Romania (2018.10.10-2018.10.12)] 2018 International Semiconductor Conference (CAS) - Second Harmonic Generation: A Non-Destructive Characterization Method for Dielectric-Semiconductor Interfaces

摘要： This paper reviews the application of second harmonic generation (SHG) to characterize dielectric-semiconductor interfaces in microelectronics and photovoltaics. Based on non-linear optics, the method is non-destructive, so particularly advantageous for thin films. The theoretical background shows the possibility to access the electric field at interfaces and consequently to have a non-destructive measurement for interface state densities or fixed charges in oxides. Two more detailed examples of application of SHG characterization will be shown: passivation of silicon using thin film deposited alumina and interface analysis of silicon-on-insulator substrates.