- 标题
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Micro/Nanolithography - A Heuristic Aspect on the Enduring Technology || Large-Area Nanoimprint Lithography and Applications
摘要： Large-area nanoimprint lithography (NIL) has been regarded as one of the most promising micro/nano-manufacturing technologies for mass production of large-area micro/nanoscale patterns and complex 3D structures and high aspect ratio features with low cost, high throughput, and high resolution. That opens the door and paves the way for many commercial applications not previously conceptualized or economically feasible. Great progresses in large-area nanoimprint lithography have been achieved in recent years. This chapter mainly presents a comprehensive review of recent advances in large-area NIL processes. Some promising solutions of large-area NIL and emerging methods, which can implement mass production of micro- and nanostructures over large areas on various substrates or surfaces, are described in detail. Moreover, numerous industrial-level applications and innovative products based on large-area NIL are also demonstrated. Finally, prospects, challenges, and future directions for industrial scale large-area NIL are addressed. An infrastructure of large-area nanoimprint lithography is proposed. In addition, some recent progresses and research activities in large-area NIL suitable for high volume manufacturing environments from our Labs are also introduced. This chapter may provide a reference and direction for the further explorations and studies of large-area micro/nano patterning technologies.
关键词： roller-type NIL,large-area micro/nano patterning,roll-to-roll NIL,large-area nanoimprint lithography,full wafer NIL,roll-to-plate NIL
更新于2025-09-19 17:15:36
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Optimal Design of Narrow Line‐Width Front Contact Grid Pattern for Silicon Solar Cells and Low‐Cost Fabrication of Electroless Nickel Plated Imprint Lithography Hard Stamp
摘要： Herein, a systematic investigation on the design and development of a cost-effective nickel hard stamp suitable for fabrication of a new front-side metallization pattern to reduce the shadow losses in solar cells is demonstrated. Finite element analysis (FEA)–based simulations indicate an optimal ?nger width of (cid:1)20 μm with inter?nger spacing of 1000 μm which can effectively enhance solar cell ef?ciency by (cid:1)1% due to reduced shadow loss. The optimal grid design is further patterned by means of nanoimprint lithography (NIL) followed by an electroless deposition method. A cost-effective, electroless deposited nickel hard template is developed for NIL patterning using UV pattern transfer. To avoid the physical damages during the imprinting process and improve the durability of the NIL stamp, silane-based antiadhesive coating is used which can withstand up to 18 cycles of imprinting process. The nickel hard stamp exhibits improved hardness of 5.63 GPa and roughness of 8 nm and is used to transfer the narrow-line width patterns during the imprinting process. The proposed industry-ready technology overcomes the limitations of the existing screen printing process pertaining to the formation of high-aspect-ratio narrow line-width ?nger grid patterns.
关键词： anti-adhesive coating,front contact metallization,solar cells,nanoimprint lithography,nickel hard stamps
更新于2025-09-19 17:13:59
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Nanoscale junctions for single molecule electronics fabricated using bilayer nanoimprint lithography combined with feedback controlled electromigration
摘要： Nanoscale Junctions for Single Molecule Electronics Fabricated using Bilayer Nanoimprint Lithography combined with Feedback Controlled Electromigration. Nanoimprint lithography (NIL) is a fast, simple and high throughput technique that allows fabrication of structures with nanometre precision features at low cost. We present an advanced bilayer nanoimprint lithography approach to fabricate four terminal nanojunction devices for use in single molecule electronic studies. In the first part of this work, we demonstrate a NIL lift-off process using a bilayer resist technique that negates problems associated with metal side-wall tearing during lift-off. In addition to precise nanoscale feature replication, we show that it is possible to imprint micron-sized features while still maintaining a bilayer structure enabling an undercut resist structure to be formed. This is accomplished by choosing suitable imprint parameters as well as residual layer etching depth and development time. We then use a feedback controlled electromigration procedure, to produce room-temperature stable nanogap electrodes with sizes below 2 nm. This approach facilitates the integration of molecules in stable, solid-state molecular electronic devices as demonstrated by incorporating benzenethiol as molecular bridges between the electrodes and characterizing its electronics properties through current-voltage measurements. The observation of molecular transport signatures, showing current suppression in the I-V behaviour at low voltage, which is then lifted at high voltage, signifying on- and off-resonant transport through molecular levels as a function of voltage, is confirmed in repeated I-V sweeps. The large conductance, symmetry of the I-V sweep and small value of the voltage minimum in Transition Voltage Spectroscopy indicates the bridging of the two benzenethiol molecules is by π–stacking.
关键词： electromigration,transition voltage spectroscopy,nanoimprint,lithography,benzenethiol,bilayer resist,molecular bridge,molecular electronics
更新于2025-09-16 10:30:52
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Electrically tunable multicolored filter using birefringent plasmonic resonators and liquid crystals
摘要： Dynamic tuning of color filters finds numerous applications including displays or image sensors. Plasmonic resonators are sub–wavelength nanostructures which can tailor the phase, polarization and amplitude of the optical field but they are limited in color vibrancy when used as filters. In this work, birefringence–induced colors of plasmonic resonators and a fast switching thin liquid crystal cell are combined in a multicolored electrically tunable filter. With this mechanism, the color gamut of the plasmonic surface and the liquid crystal cell is mutually enhanced in order to generate all primary additive and subtractive colors with high saturation as well as different tones of white. A single filter is able to cover more than 70% of the color gamut of standard RGB filters by applying a voltage ranging between 2V and 6.5V. This spectral selectivity is added in transmission without any loss in the image resolution. The presented approach is foreseen to be implemented in a variety of devices including miniature sensors or smart-phone cameras to enhance the color information, ultra–flat multispectral imagers, wearable or head–worn displays as well as high resolution display panels.
关键词： liquid crystals,color display,nanoimprint lithography,multispectral imaging,Plasmonic colors,tunable filters
更新于2025-09-12 10:27:22
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Low-cost flexible plasmonic nanobump metasurfaces for label-free sensing of serum tumor marker
摘要： The use of plasmonic metasurface for sensing have great potential on label-free detection of human tumor markers, which could benefit clinical examination. In this work, we adopt nanoimprint and plasma etching to optimize the nanofabrication for low-cost flexible plasmonic metasurface sensors with gold nanobump arrays, which enable facile surface bio-functionality, high sensitivity and simple optical measurement in the visible range. A high bulk refractive index sensitivity of 454.4 nm/RIU is achieved for the prototype plasmonic metasurface sensors at the wavelengths from 620nm to 720 nm. The rapid quantitative tumor marker sensing of carcinoembryonic antigen in human serum samples from less than 10 ng/mL to more than 87 ng/mL is achieved, which demonstrates good agreement with the conventional chemiluminescence immunoassay system and sufficiently covers the threshold tumor marker concentration of 20 ng/mL for early cancer prediction. Our method is capable of low-cost high-throughput manufacturing for flexible lightweight plasmonic metasurface sensors, which will facilitate wide applications on portable biomedical sensing devices for future point-of-care diagnosis and mobile healthcare.
关键词： plasmonics,biosensing,nanoimprint lithography,immunoassay
更新于2025-09-11 14:15:04
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A Method for Estimating the Filling Rate of the Mold Cavity in Nanoimprint Lithography
摘要： When the dimensions of a microelectronic structure decrease, high manufacturing costs are inevitable. A low cost and high throughput manufacturing technique for nanostructures is desired. Nanoimprint lithography involves patterning the resist through physical deformation by using a mold at nanoscale and has the potential to meet these expectations. Therefore, nanoimprint lithography has been extensively studied in recent years. Many real time measurements have been proposed for enhancing the yield of nanoimprint lithography. Among these measurements, the application of surface plasmon resonance has the advantage of quick, highly accurate analysis. In surface plasmon resonance application, the mold contains a gold ?lm for exciting surface plasmon resonance and an adhesion layer is applied to both sides of the gold ?lm to increase the lifespan of the mold. However, the effect of the geometric characteristics of the adhesive layer on the surface plasmon resonance spectrum and the mechanical strength of the mold has not been extensively studied. To improve the detection accuracy and reliability of the measurement, this study investigated the aforementioned effect. Analytical and experimental investigations con?rmed that the shape of the spectrum is in?uenced by the surface roughness and thickness of the titanium adhesion layer. To maintain the sharpness of the resonance dip, we suggest reducing the thickness of the titanium adhesion layer to below 6 nm and maintaining the surface roughness below 3 nm. Moreover, the proposed mold structure conforms to these requirements and is applied to estimate the ?lling rate. The measurement results demonstrate that the surface plasmon resonance spectrum is clearly affected by the mold ?lling. Speci?cally, the change in the surface plasmon resonance spectrum curve and resonance angle can indicate the quality of the imprinted pattern. This study demonstrates the effectiveness and high sensitivity of the proposed technique for estimating the ?lling rate of the mold cavity in nanoimprint lithography.
关键词： Nanoimprint Lithography (NIL),Surface Roughness,Filling Rate,Surface Plasmon Resonance (SPR),Non-Destructive Measurement
更新于2025-09-10 09:29:36
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Nano pattern transfer on acrylic polymers with UV irradiation for liquid crystal alignment
摘要： Ultra-violet nanoimprint lithography was utilized to transfer a one-dimensional nano pattern onto a hydrophilic ultra-violet cured polymer surface for use in liquid crystal displays. A master mold with the one-dimensional nano pattern was initially constructed using laser interference lithography, which is a fast and maskless process that can be employed over a large area. The UV cured polymer showed a hydrophilic characteristic, and was used as a homogeneous alignment layer. The nano-patterned ultra-violet polymer successfully aligned the liquid crystal molecules without defects. Additionally, the liquid crystal cell was characterized by high thermal stability due to the high thermal endurance of UV cured polymer. Therefore, the proposed ultra-violet nanoimprint lithography technique is beneficial for advanced liquid crystal devices with high brightness and resolution with numerous switching components that require a high thermal cost.
关键词： liquid crystal alignment,hydrophilic UV-cured polymer,thermal stability,Ultra-violet nanoimprint lithography
更新于2025-09-10 09:29:36
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Nanostructured Free-Form Objects via a Synergy of 3D Printing and Thermal Nanoimprinting
摘要： High-resolution surface patterning has garnered interests as a nonchemical-based surface engineering approach for creating functional surfaces. Applications in consumer products, parts for transportation vehicles, optics, and biomedical technologies demand topographic patterning on 3D net shape objects. Through a hybrid approach, high-resolution surface texture is incorporated onto 3D-printed polymers via direct thermal nanoimprinting process. The synergy of geometry design freedom in 3D printing and the high spatial resolution in nanoimprinting is demonstrated to be a versatile fabrication of high-fidelity surface pattern (from 2 μm to 200 nm resolution) on convex, concave semicylindrical, and hemispherical objects spanning a range of surface curvatures. The novel hybrid fabrication is further extended to achieve a high-resolution curved mold insert for rapid prototyping via injection molding. The versatility of the fabrication strategies reported here not only provides a post-3D printing process that enhances the surface properties of 3D-printed objects but also opens a new pathway to enable future study on the effects of combining microscale and nanoscale surface texture with macroscopic curvature. Both have been known, individually, as an effective approach to tune surface functionalities.
关键词： nanostructured 3D mold insert,nanoinjection molding,nanoimprint lithography,3D printing,curved object
更新于2025-09-09 09:28:46