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Stretchable active matrix of oxide thin-film transistors with monolithic liquid metal interconnects
摘要： We demonstrate a new process scheme for fabricating stretchable active matrices of oxide thin-film transistors (TFTs), where TFTs and cross points of two metal layers on stiff islands are monolithically integrated with gallium-based liquid metal interconnects within an elastomeric matrix. As the liquid metal interconnects are formed by a photolithography-based technique compatible with conventional flexible circuit technology, this approach can provide high integration density and mechanical durability as required in stretchable displays or electronic skins. We have fabricated a 4 × 4 active matrix of oxide TFTs within a 20 × 20 mm2 area, which provides stable operation up to 40% of stretching.
关键词： liquid metal interconnects,oxide thin-film transistors,active matrix,photolithography,stretchable electronics
更新于2025-09-04 15:30:14
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Deposition and Patterning of Polycrystalline Diamond Films Using Traditional Photolithography and Reactive Ion Etching
摘要： Given the exceptional characteristics of diamond films, they have become increasingly popular in the fields of medicine, microelectronics, and detector electronics. However, despite all the advantages, there are many technological problems that complicate their widespread application and impose limitations on diamond use in technological processes. In this study, we proposed a new technique for obtaining a complex topology of polycrystalline diamond coatings by selective seeding of the substrate by nucleation centers and subsequent surface treatment with reactive ion etching to reduce the number of parasitic particles. As a result, diamond films were obtained with a high particle concentration in the film region and high repeatability of the pattern. Moreover, parasitic particles influenced neutralization in areas where film coverage was not needed. The effect of the diamond nanoparticle concentration in a photoresist and the effect of reactive ion etching on the formation of a continuous film and the removal of parasitic nucleation centers were examined. The relative simplicity, low power consumption, and high efficiency of this method make it attractive for both industrial and scientific applications.
关键词： pattern,diamond,parasitic particles,deposition,photolithography,reactive ion etching,films,selective,CVD
更新于2025-09-04 15:30:14