Propriedades de filmes finos de ZnO:Al depositados sobre substratos de poliimida à temperatura ambiente para aplica??es em dispositivos optoeletr?nicos flexíveis

摘要： This work investigated the properties of ZnO:Al thin films produced by radio frequency magnetron sputtering onto polyimide substrates for use as flexible electrodes in optoelectronic devices. For comparison purposes, films were also grown on soda lime glass. The films were deposited with different working powers, onto substrates kept at room temperature. The effects of the power and thickness on the optical, electrical and structural properties of the films were investigated. Atomic force microscopy images revealed that the films were nanocrystalline, with low surface roughness. Values of sheet resistance and transmittance in the visible range were 8 ?/sq (corresponding to 6x10-4 W.cm) and 75%, respectively, which can be considered satisfactory, particularly taking into consideration that deposition was carried out at room temperature.