1：Experimental Design and Method Selection:

The study utilized radio frequency magnetron sputtering to deposit ZnO:Al thin films on polyimide and soda lime glass substrates at room temperature. The effects of power and thickness on the films' properties were examined.

2：Sample Selection and Data Sources:

Films were deposited on polyimide (Kapton? 100CS) and soda lime glass substrates. The polyimide substrates were provided by Dupont.

3：List of Experimental Equipment and Materials:

A non-commercial radio frequency magnetron sputtering system was used. Targets were ZnO:Al (98% ZnO/2% Al) from AJA International. Characterization tools included a Veeco Dektak 150 profilometer, Bio-Rad HL 5500 Hall effect measurement system, Varian Cary 5000 spectrophotometer, and Park Systems XE7 atomic force microscope.

4：Experimental Procedures and Operational Workflow:

Films were deposited at various working powers (45 to 180 W) with argon pressure at 1 mTorr. Substrates were cleaned ultrasonically with deionized water and neutral detergent. The deposition rate was monitored, and film thickness was controlled to around 180 nm for initial studies.

5：Data Analysis Methods:

Electrical properties were measured using the Van der Pauw method. Optical transmittance was measured, and the bandgap was calculated from absorption spectra. Surface morphology was analyzed using atomic force microscopy.