研究目的
Developing a new sacrificial layer for laser transfer process to temporarily dock metallic substrate to a glass substrate for flexible-display production.
研究成果
The study successfully implemented GaN and α-GaOx as SL for LLO process of metallic foil. The use of Al2O3 barrier layer prevented Fe diffusion toward SL, enabling effective LLO process and successful delamination of the flexible substrate.
研究不足
The study highlights the need for SL with low thermal conductivity to prevent damage to the flexible substrate during laser scan. The diffusion of elements during heat treatment could lead to contamination and poor delamination.
1：Experimental Design and Method Selection:
The study involved the development of a sacrificial layer (SL) for laser transfer process, using amorphous gallium nitride and non-stoichiometric gallium oxide for laser lift off (LLO) processes.
2：Sample Selection and Data Sources:
Invar foil and Alkaline Earth Boro-Aluminosilicate glass were used as substrates.
3：List of Experimental Equipment and Materials:
Equipment included a metal organic chemical vapor deposition (MOCVD) system, e-beam evaporation equipment, and a Nd:YAG laser. Materials included glass powder, GaN, and α-GaOx.
4：Experimental Procedures and Operational Workflow:
The process involved cleaning samples, depositing SL layers, bonding metal foil to glass sheet using heat treatment, and debonding using LLO method.
5：Data Analysis Methods:
Transmission electron microscopy, element mapping, and energy dispersive X-ray spectroscopy analyses were performed.
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