研究目的
Investigating the influence of different post-annealing temperatures on the physical properties of La0.72Ca0.28MnO3:Ag0.2 thin films prepared by pulsed laser deposition technique.
研究成果
Post-annealing temperatures significantly affect the crystallinity, surface morphology, and electrical properties of La0.72Ca0.28MnO3:Ag0.2 thin films. The optimal annealing temperature was found to be 1200 °C, resulting in improved crystallinity, smoother surfaces, and enhanced electrical properties, making these films promising for applications in thermal detectors near room temperature.
研究不足
The study is limited by the evaporation of thin films at high annealing temperatures (1300 and 1400 °C), which affects their electrical properties and surface morphology. The oxygen content in the air during annealing also limits the compensation for oxygen vacancies.
1：Experimental Design and Method Selection:
The study involved preparing La
2：72Ca28MnO
Ag0.2 thin films using pulsed laser deposition (PLD) technique and post-annealing them at different temperatures in air to investigate their physical properties.
3：2 thin films using pulsed laser deposition (PLD) technique and post-annealing them at different temperatures in air to investigate their physical properties.
Sample Selection and Data Sources:
2. Sample Selection and Data Sources: High purity chemicals were used to prepare the polycrystalline target via the sol-gel method. Thin films were deposited on LaAlO3 (100) substrates.
4：List of Experimental Equipment and Materials:
PLD device, X-ray diffraction (XRD, Rigaku Ultima IV), atomic force microscopy (AFM, Bruker multimode 8), scanning electron microscopy (SEM, ZEISS sigma 300), and a standard four-probe technique for resistance vs. temperature measurements.
5：Experimental Procedures and Operational Workflow:
Thin films were post-annealed at temperatures ranging from 900 to 1400 °C in air for 1 hour. The structural, morphological, and electrical properties were then characterized.
6：Data Analysis Methods:
XRD was used for structural analysis, AFM and SEM for surface morphology, and the four-probe method for electrical properties.
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