研究目的
Investigating the influences of passivation hole etching on the ITO and metal contact for bottom emission AMOLED display.
研究成果
The study concludes that when the PV film uniformity is good, corrosion does not significantly affect the contact between ITO and metal electrodes. However, poor PV film uniformity leads to increased overetching, resulting in metal corrosion and poor panel performance. The best results were achieved with PV hole etching after PLN patterning.
研究不足
The study is limited by the conditions of PV film uniformity and the potential for metal corrosion under certain etching sequences, which may affect the contact between ITO and metal electrodes.
1：Experimental Design and Method Selection:
The study involved three different passivation hole etching sequences to examine their effects on the contact between ITO and Source/Drain electrodes.
2：Sample Selection and Data Sources:
The experiments were conducted on a top-gate self-aligned a-IGZO TFT backplate with white OLED and color filter.
3：List of Experimental Equipment and Materials:
Equipment included plasma enhanced chemical vapor deposition (PECVD) for SiO2 layer deposition, SEM and OM for observation, and TEG for analysis.
4：Experimental Procedures and Operational Workflow:
The process involved PV hole etching, RGB patterning, and PLN patterning under three different sequences, followed by ITO deposition and patterning.
5：Data Analysis Methods:
The contact resistance (Rc) between M2 and ITO was measured, and the results were analyzed to assess the impact of etching sequences.
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