研究目的
Exploring new opportunities of TiO2 metasurfaces in photochemistry by converting them to black TiO2 metasurfaces using a CMOS-compatible technique.
研究成果
The developed CMOS-compatible technique successfully expanded the applications of TiO2 metasurfaces from planar visible photonics to photochemistry, enabling both accelerated chemical reactions and selective wavelength responses. This opens new routes for novel photonic devices and beyond.
研究不足
The technique's dependency on specific ion implantation conditions and the need for precise control over the implantation time to achieve desired absorption properties.
1:Experimental Design and Method Selection:
Developed a CMOS-compatible technique to reversibly and precisely control the absorption of TiO2 metasurfaces without spoiling their internal nanostructures.
2:Sample Selection and Data Sources:
Fabricated TiO2 metasurfaces and converted them to black TiO2 metasurfaces for photochemical experiments.
3:List of Experimental Equipment and Materials:
Used an inductively coupled plasma (ICP) etcher (Oxford PlasmaPro 100 Cobra) for ion implantation.
4:Experimental Procedures and Operational Workflow:
Implanted H+ ions into TiO2 film to convert it to black TiO2 and reversed the process with O? ions.
5:Data Analysis Methods:
Measured reflection and absorption spectra, and analyzed the sizes of Ag nanoparticles generated in photochemical reactions.
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ICP etcher
PlasmaPro 100 Cobra
Oxford Instruments
Used for ion implantation to convert TiO2 to black TiO2.
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Optical microscope
Axioscope AI
ZEISS
Used for optical characterization of the samples.
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E-beam writer
Raith eLINE
Raith
Used for patterning nanostructures in the fabrication of TiO2 metasurfaces.
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CCD coupled spectrometer
Acton Research 2750
Princeton Instruments
Used for collecting and analyzing reflected and transmitted light from the samples.
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