研究目的
Investigating the influence of post-deposition fabrication processes on the hole collection efficiency of Si/MoOX heterojunction and the quantitative estimation of its band diagram for carrier selective solar cells.
研究成果
The study concludes that evaporation of MoOX without intentional heating provides the best passivation to silicon, but annealing and sputtering degrade the Si/MoOX heterojunction passivation. The band alignment of MoOX with Si is quantitatively determined, revealing substrate-dependent workfunction and electron affinity values. A heterojunction solar cell with MoOX as a hole extracting contact achieves an efficiency of 12.8%.
研究不足
The study is limited by the degradation of passivation quality due to annealing and sputtering processes, and the substrate-dependent workfunction of MoOX.
1:Experimental Design and Method Selection:
The study involves the deposition of MoOX on Si wafers, followed by annealing and sputtering processes to analyze their impact on the heterojunction's performance. Spectroscopic and electrical characterizations are used to determine the band alignment.
2:Sample Selection and Data Sources:
RCA cleaned n-type, float zone silicon wafers are used. Data is collected through electron spectroscopy, optical and electrical measurements.
3:List of Experimental Equipment and Materials:
Equipment includes a vacuum chamber for MoOX deposition, Sinton lifetime measurement tool, SEM, UV–Visible-NIR Spectrophotometer, XPS, UPS, and RF magnetron sputtering for ITO deposition.
4:Experimental Procedures and Operational Workflow:
MoOX is deposited on Si wafers, followed by annealing and sputtering. Lifetime measurements, SEM imaging, transmittance measurements, and CV characteristics are performed to analyze the effects.
5:Data Analysis Methods:
Data is analyzed to determine the band alignment, workfunction, and electron affinity of MoOX, and to assess the degradation of passivation quality.
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