研究目的
Investigation of highly transparent contacts to the 1D hole gas in ultra-scaled Ge/Si core/shell nanowires and their potential for quantum computing applications.
研究成果
The synthesis and electrical characterization of crystalline axial Al-Ge/Si-Al core/shell NW heterostructures with highly transparent contacts have been successfully demonstrated. The observations of stable MARs and quantized conductance affirmed the great quality of the interface and a high contact transparency, greater than 96% of the metal-semiconductor contact. The system shows promise for future ultra-scaled axial and radial nanoelectronic devices and quantum computing applications.
研究不足
The study focuses on the fabrication and characterization of Al-Ge/Si-Al nanowire heterostructures, with potential limitations in scalability and reproducibility for mass production. The experimental setup requires sophisticated equipment and conditions, such as low-temperature measurements and precise lithography.
1:Experimental Design and Method Selection
The study involves the synthesis of axial Al-Ge-Al nanowire heterostructures with atomically precise interfaces, enwrapped by an ultra-thin epitaxial Si layer. The heterostructures were synthesized by a thermally induced exchange reaction of single-crystalline Ge/Si core/shell nanowires and lithographically defined Al contact pads.
2:Sample Selection and Data Sources
The starting materials are vapor-liquid-solid grown core/shell NWs with a Ge NW core diameter of 30 nm and a Si shell thickness of about 3 nm covered by a thin layer of native oxide.
3:List of Experimental Equipment and Materials
FEI Titan Themis (for STEM), semiconductor analyzer (HP 4156B and Keysight B1500A), 4He cryostat (Cryo Industries CRC-102), pumped 3He cryostat, National Instruments PCI DAC/ADC high frequency card, Femto variable gain transimpedance amplifier (DCPCA-200), NF Electronic Instruments low noise preamplifiers (LI-75A), Yokogawa programmable voltage source.
4:Experimental Procedures and Operational Workflow
The NWs were drop casted onto an oxidized highly p-doped Si substrate and the Ge core NW was contacted by Al pads fabricated by electron beam lithography, 100 nm Al sputter deposition and lift-off techniques. The Al-Ge exchange reaction is induced by rapid thermal annealing at a temperature of T = 674 K in forming gas atmosphere.
5:Data Analysis Methods
The transport measurements were carried out using a two probe configuration; the wiring resistance was subtracted. Electrical measurements below T = 5 K were carried out using a self-built pumped 3He cryostat with a base temperature of T = 400 mK.
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