研究目的
Investigating the effect of plasma treatment on an indium tin oxide (ITO) film under an ambient Ar atmosphere to control the barrier height between ITO and a-Si:H (n) for silicon heterojunction solar cells.
研究成果
The decrease in the work function of the ITO film due to Ar plasma treatment resulted in an increased open circuit voltage of the silicon heterojunction solar cells. This was attributed to the reduction in the barrier height between the ITO and a-Si:H (n). The study demonstrated that Ar plasma treatment can be used to improve cell efficiency by controlling the barrier height in transparent conducting oxide applications.
研究不足
The study focused on the effect of Ar plasma treatment on ITO films and its application in SHJ solar cells. The limitations include the specific conditions of plasma treatment and the focus on ITO films, which may not be applicable to other materials or conditions.
1：Experimental Design and Method Selection:
The study involved the deposition of ITO films by RF magnetron sputtering on Corning Eagle XG glass substrates, followed by Ar plasma treatment using a PECVD system. The effect of plasma treatment on the ITO films was investigated by varying the RF power.
2：Sample Selection and Data Sources:
A commercial n-type solar graded CZ Si wafer was used as the base material for the SHJ solar cells. The amorphous silicon layers of the SHJ solar cell were deposited at a temperature of 200 °C by chemical vapor deposition.
3：List of Experimental Equipment and Materials:
RF magnetron sputtering system, PECVD single chamber system, Hall measurement system (ECOPIA HMS-3000), UV-Vis measurement system (SCINCO S-3000), X-ray diffraction (XRD), field effect scanning electron microscopy (FE-SEM), X-ray photoelectron spectroscopy (XPS), and current-voltage (I-V) characteristics measurement under a simulated 100 mW/cm2 AM
4：5 spectrum. Experimental Procedures and Operational Workflow:
The ITO films were deposited and then exposed to Ar plasma for 3 min. The SHJ solar cells were fabricated using the plasma-treated ITO film, and their performance was evaluated.
5：Data Analysis Methods:
The work functions of the as-deposited and plasma-treated ITO films were measured, and the electrical properties, optical transmission, structural properties, and surface morphology were analyzed. The performance of the SHJ solar cells was simulated using AFORS-HET.
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