研究目的
To evaluate the applicability of F4-TCNQ as a functionalization material or as an electrically active part in devices by studying its growth mode on different inorganic substrates.
研究成果
F4-TCNQ follows a Stranski-Krastanov growth mode on all substrates investigated, forming monolayers and islands of different sizes. GaN nanowires act as nucleation sites for F4-TCNQ islands, and the molecules form a closed coaxial shell around the nanowires. The findings provide essential information for using F4-TCNQ in nanowire-based applications.
研究不足
The study was limited to a small range of substrate temperatures and did not explore higher temperatures due to potential reevaporation of F4-TCNQ. The influence of molecule orientations on different substrates was not fully explored.
1:Experimental Design and Method Selection:
The study involved the deposition of F4-TCNQ on various inorganic substrates using organic molecular beam deposition (OMBD) under ultra-high vacuum (UHV) conditions.
2:Sample Selection and Data Sources:
Substrates included silicon, silicon carbide, graphene on silicon, sapphire, nanocrystalline diamond, and gallium nitride (GaN) layers and nanowire arrays.
3:List of Experimental Equipment and Materials:
AFM, SEM, and XPS were used for characterization.
4:Experimental Procedures and Operational Workflow:
Substrates were cleaned and treated before F4-TCNQ deposition. The growth was characterized by AFM, SEM, and XPS.
5:Data Analysis Methods:
The growth mode was analyzed based on the morphology and thickness of F4-TCNQ layers.
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