研究目的
To propose a TiO2/SnO2/Ni multi-heterojunction structure to reduce the carrier recombination loss in immobilized TiO2 films, thereby enhancing their photocatalytic activity.
研究成果
The TiO2/SnO2/Ni multi-junction structure significantly enhances the photocatalytic activity of TiO2 films by effectively separating photogenerated electron-hole pairs and reducing carrier recombination, outperforming single junction structures and demonstrating the potential for applications in photocatalysis and other devices like solar cells.
研究不足
The study acknowledges the difficulty in obtaining TiO2 films with the same structure and surface roughness on different underlying layers, which complicates the isolation of the effects of multi-junctions from those of film structure and roughness on photocatalytic activity.
1：Experimental Design and Method Selection:
The study involved the fabrication of TiO2 films on various substrates (blank glass, Ni/Ti coated glass, SnO2 coated glass, and SnO2/Ni/Ti coated glass) using atomic layer deposition (ALD) to explore the effects of multi-heterojunction structures on photocatalytic activity.
2：Sample Selection and Data Sources:
Corning E2000 glass sheets were used as substrates. The photocatalytic activity was evaluated by measuring the degradation of methylene blue (MB) under UV-light irradiation.
3：List of Experimental Equipment and Materials:
E-beam evaporator for Ti and Ni layers, ALD for SnO2 and TiO2 layers, 4-point probe for conductivity measurement, profilometer and ellipsometer for thickness determination, atomic force microscope for surface roughness, grazing incident X-ray diffractometer for crystalline structure identification, and a spectrometer for absorbance measurement.
4：Experimental Procedures and Operational Workflow:
The substrates were cleaned and then coated with Ti, Ni, SnO2, and TiO2 layers in sequence. The photocatalytic activity was assessed by monitoring the degradation rate of MB solution under UV irradiation.
5：Data Analysis Methods:
The photocatalytic degradation of MB was described by an exponential decay function, and the residual MB concentration was extracted by the change of absorbance at 668 nm.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容-
Corning E2000 glass sheet
E2000
Corning
Used as the substrate for the deposition of various thin films.
-
Atomic Layer Deposition (ALD) system
Used for growing SnO2 and TiO2 layers.
-
E-beam evaporator
Used for growing Ti and Ni layers.
-
4-point probe
Used for characterizing the conductivity of Ni/Ti and SnO2 layers.
-
Profilometer
Used for determining the thickness of Ni/Ti layers.
-
Ellipsometer
Used for determining the thickness of SnO2 and TiO2 layers.
-
Atomic Force Microscope (AFM)
Used for measuring the surface roughness of films.
-
Grazing Incident X-ray Diffractometer (GIXRD)
Used for identifying the crystalline structures of deposited films.
-
He-Cd laser
Used as the excitation source for photoluminescence (PL) measurement.
-
Sankyo Denki blacklight lamps
Sankyo Denki
Used as UV light sources for photocatalytic activity evaluation.
-
Spectrometer
Used for measuring the decrease of the absorbance of MB solutions.
-
登录查看剩余9件设备及参数对照表
查看全部
