研究目的
To present an alternative maskless, ultra-rapid, and low-cost microchannel fabrication method using a microplotter for direct writing of photoresist mold with a resolution of 10 μm.
研究成果
The presented method is ultra-rapid and low-cost for microfabrication, capable of fabricating microchannels as narrow as 39.65 μm without clean room facilities. The method's resolution can be improved through vibration suppression.
研究不足
Limited to photoresist with viscosity less than 450 cPs. Requires substrates with high surface wettability. Minimum feature size of 10 μm imposed by mechanical noise of the pipette.
1：Experimental Design and Method Selection:
The method employs a microplotter and glass pipette for direct writing of photoresist on a PDMS substrate.
2：Sample Selection and Data Sources:
PDMS is mixed with curing agent and cast onto a glass mold to make a PDMS substrate. Photoresist is diluted with acetone to lower its viscosity.
3：List of Experimental Equipment and Materials:
Microplotter, glass pipette, photoresist, PDMS, acetone, hot-plate.
4：Experimental Procedures and Operational Workflow:
The photoresist is loaded into the pipette through capillary forces, then used to write microfeatures on PDMS. The photoresist is cured on a hot-plate, and a second layer of PDMS is cast onto the mold, cured, and peeled off to obtain the microfeatures.
5：Data Analysis Methods:
Optical measurement of microfeature dimensions.
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