研究目的
To develop selective growth of monolayer MoS2 for emulating diverse synaptic junctions with controllable conductance plasticity, addressing the limitations of conventional semiconductor and memristive devices in achieving proper synaptic networks.
研究成果
Selective CVD growth of monolayer MoS2 based on precursor density control was developed for constructing efficient and integrated synaptic networks. The resistive-heating effect and MIT in MoS2 enable the engineering of synaptic plasticity for excitatory and inhibitory synapses, paving the way for mimicking complex cognitive processes in the brain.
研究不足
The study is limited by the precision requirements and bandwidth requirements for integrating synaptic functionalities into artificial neural networks. The influence of ambient conditions on device performance and the need for passivation to prevent oxidation are also noted.
1:Experimental Design and Method Selection
The study employed the atmospheric-pressure chemical vapor deposition (APCVD) method for the selective growth of monolayer MoS2 with varying carrier densities. The resistive-heating effect and metal-insulator transition (MIT) in MoS2 were investigated to understand the conductance plasticity.
2:Sample Selection and Data Sources
Four different groups of monolayer MoS2 samples were grown with varying precursor concentrations. Optical, Raman, and Photoluminescence (PL) spectra were measured to characterize the samples.
3:List of Experimental Equipment and Materials
Commercial sulfur and sodium molybdate dihydrate were used as precursors. A Witec Alpha300 Confocal System was used for Raman and PL measurements. Electron beam lithography (EBL) was used for electrode patterning.
4:Experimental Procedures and Operational Workflow
The MoS2 was grown on SiO2 substrates, characterized optically and electrically, and then fabricated into devices for electrical characterization. Finite element analysis was performed to simulate temperature distribution.
5:Data Analysis Methods
The conductance plasticity was analyzed through successive Id-Vd sweeps. The origin of conductance plasticity was attributed to resistive-heating and MIT in MoS2.
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