研究目的
To present the design details for a modular diagnostic-accessible reactor and to provide insight into the operation of the reactor for ALD, including characterizing purge times for TDMAT and water in a typical pressure and flow regime for ALD.
研究成果
A diagnostic-accessible ALD reactor capable of depositing device quality oxides using thermal ALD while being small enough to be easily integrated into an optical train was described. Purge times for precursors could be estimated using a simple exponential decay model, demonstrating the reactor's utility for in situ diagnostics of ALD processes.
研究不足
The reactor's design and operation are optimized for ALD and CVD processes, with specific focus on thermal deposition. The study does not explore other deposition techniques or materials beyond TDMAT and water.
1：Experimental Design and Method Selection:
The reactor was designed to be optically accessible for probing thermal thin film deposition processes. It was characterized using infrared absorption measurements.
2：Sample Selection and Data Sources:
TDMAT and water were used as prototypical ALD precursors due to their significantly different mass diffusivity values.
3：List of Experimental Equipment and Materials:
The reactor consists of an expansion cone, reactor body, and exhaust manifold with an integrated wafer chuck. Materials include aluminum and stainless steel components, with heating provided by wire wrap kapton heaters and cartridge heaters.
4：Experimental Procedures and Operational Workflow:
Gases were introduced into the expansion cone, with constant flow maintained by pressure-based mass flow controllers. Precursors were injected in controlled sequences, and their concentrations were measured over time.
5：Data Analysis Methods:
The time-dependent concentration profiles of TDMAT and water were analyzed using infrared absorption measurements, with data normalized to maximum values.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容
