研究目的
To improve the efficiency of the surface flattening process using photoemission-assisted plasma ion source by investigating current-bias voltage characteristic and Ar+ ions/Ar atoms ratio in the plasma.
研究成果
UV irradiation reduces the glow discharge starting voltage and increases the number of Ar+ ions irradiated to the substrate in glow discharge. However, in PA Townsend discharge, space charges near the cathode neutralize Ar+ ions, reducing their number reaching the substrate. The findings suggest potential for atomic-scale surface flattening using both Ar+ ion and Ar atom beams.
研究不足
The study is limited by the conditions of PA Townsend discharge where space charges near the cathode substrate neutralize Ar+ ions, reducing their number reaching the substrate.
1：Experimental Design and Method Selection:
The study involved optical emission spectroscopy (OES) measurements in PA Ar plasma to investigate the bias voltage dependence of Ar+ ion density in the plasma under various conditions.
2：Sample Selection and Data Sources:
A 3-inch sized Au coated Si wafer was used as the substrate. Ar gas was introduced into the process chamber.
3：List of Experimental Equipment and Materials:
The apparatus included a UV lamp with a wavelength of 172 nm, gas supply and evacuation system, and a monochromator for OES (HORIBA, HR460).
4：0). Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: UV light from a Xe excimer lamp irradiated the sample holder through a quartz window. The bias voltage and current were measured by digital multimeters.
5：Data Analysis Methods:
The study analyzed the glow discharge starting voltage and current, and the Ar II/Ar I photoemission intensity ratio.
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