研究目的
Investigating the fabrication of quasicrystal surface relief grating (SRG) on azopolymer films using photo-reconfigurable azobenzene property and light interference lithography (LIL) process.
研究成果
The study successfully demonstrated the fabrication of quasicrystal-like SRG patterns using a Fibonacci-inspired multiplex of LIL. It highlighted the importance of rotation sequence in determining the surface morphology of azopolymer films, suggesting potential applications in advanced optical elements and surface patterning.
研究不足
The study acknowledges that the underlying mechanism of photo-triggered fluidic behavior of azopolymers is not fully explained, indicating a limitation in understanding the fundamental processes involved.
1：Experimental Design and Method Selection:
The study utilized two-beam coupling light interference lithography (LIL) to inscribe various morphologies of grating patterns on azopolymer thin-films. The process involved multiplexing the LIL with different rotation sequences to achieve quasicrystal-like SRGs.
2：Sample Selection and Data Sources:
Poly (Disperse Red 1 acrylate) (PDR1A) was used as the photo-addressable azobenzene polymer. The samples were prepared by spin-coating PDR1A on glass substrates.
3：List of Experimental Equipment and Materials:
Equipment included a diode-pumped solid-state (DPSS) green laser, polarizing beam splitter (PBS), polarizer (POL), half-wave plate (HWP), and atomic force microscope (AFM). Materials included PDR1A and chloroform.
4：Experimental Procedures and Operational Workflow:
The process involved multiple light exposures with specific rotation sequences to fabricate various grating patterns. The surface topology was observed using AFM.
5：Data Analysis Methods:
The effect of rotation sequence on grating patterns was analyzed using AFM images and power spectral density (PSD) graphs.
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Poly (Disperse Red 1 acrylate)
PDR1A
Sigma-Aldrich
Photo-addressable azobenzene polymer used for optical patterning behavior by holographic lithography.
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UV-Visible spectrophotometer
UV-1800
SHIMADZU
Used to evaluate light absorption property.
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Diode-pumped solid-state green laser
Used for two-beam coupling light interference lithography.
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Polarizing beam splitter
PBS
Used to split the laser beam into two beams.
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Polarizer
POL
Used to control the polarization direction and light intensity.
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Half-wave plate
HWP
Used to control the polarization direction and light intensity.
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Atomic force microscope
XE-7
Park Systems
Used to observe the resultant surface topology.
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Alpha-step
alpha-step IQ
KLA Tencor
Used to measure film thickness.
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