研究目的
Investigating the influence of oxygen vacancy on the response properties of TiO2 ultraviolet detector.
研究成果
TiO2 films prepared by using DTS of 80 mm showed better crystallinity, larger crystallite size, and optimal response properties for UV detectors, including high responsivity and photosensitivity, and fast response time. The study provides a meaningful reference for fabricating TiO2 UV detectors with fast response.
研究不足
The study focuses on the influence of sputtering distance on TiO2 films properties and UV detector performance, but does not explore other fabrication methods or materials for UV detectors.
1：Experimental Design and Method Selection:
TiO2 films were deposited on glass substrate by reaction magnetron sputtering technology using different sputtering distances between target and substrate.
2：Sample Selection and Data Sources:
Glass substrates were cleaned with deionized water, anhydrous ethanol, and acetone before sputtering.
3：List of Experimental Equipment and Materials:
Titanium target (purity of
4：9%), argon (Ar) as sputtering gas, oxygen (O2) as reaction gas, vacuum drying oven (DZF-6020-T), X-ray diffraction (XRD) (SIEMENS D500), atomic force microscopy (AFM) (Asylum Research Cypher), scanning electron microscopy (SEM) (SIGMA 500), X-ray photoelectron spectroscopy (XPS) (PHI-5300 XPS spectrometer), fluorescence spectrometer (Shamadzu RF-5301PC). Experimental Procedures and Operational Workflow:
TiO2 films were deposited with specific sputtering parameters, annealed at 500 °C in vacuum chamber, and Au interdigitated electrode was deposited on TiO2 films surface.
5：Data Analysis Methods:
XRD for crystal structure, AFM and SEM for surface morphology, XPS for composition and chemical states, PL for luminescent properties, and I-V curves for contact property.
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scanning electron microscopy
SIGMA 500
SIGMA
Focusing on the surface micrographs and roughness of films.
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fluorescence spectrometer
Shamadzu RF-5301PC
Shamadzu
Analyzing photoluminescence (PL) properties.
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X-ray diffraction
SIEMENS D500
SIEMENS
Investigating the crystal structure and crystallinity of TiO2 films.
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vacuum drying oven
DZF-6020-T
Drying the glass substrate in vacuum condition.
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titanium target
Dumoers New Materials Inc.
Used as the sputtering target for TiO2 films deposition.
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atomic force microscopy
Asylum Research Cypher
Asylum Research
Analyzing the surface micrographs and roughness of films.
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X-ray photoelectron spectroscopy
PHI-5300 XPS spectrometer
PHI
Analyzing the composition and chemical states of TiO2 films.
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