1：Experimental Design and Method Selection:

VO2/glass monolayer and VO2/Cu50Zr50/glass bilayer structures were prepared by pulsed laser deposition (PLD) with varying thicknesses of Cu50Zr50 buffer layers. The crystallographic properties, surface morphology, MIT properties, and optical properties were characterized.

2：Sample Selection and Data Sources:

Amorphous glass substrates (BF33) were used. The thickness of the Cu50Zr50 buffer layers was varied (40 nm, 80 nm, 160 nm) to study its effect on the VO2 thin films.

3：List of Experimental Equipment and Materials:

PLD system (wavelength 248 nm), V target (99.95% purity), Cu50Zr50 alloy target (99.99% purity), X-ray diffraction (XRD) instrument (LabXRD-6000), atomic force microscopy (AFM), scanning electron microscopy (SEM), Hall Effect Measurement System (HMS-5300), double beam spectrophotometer (UV-3600).

4：95% purity), Cu50Zr50 alloy target (99% purity), X-ray diffraction (XRD) instrument (LabXRD-6000), atomic force microscopy (AFM), scanning electron microscopy (SEM), Hall Effect Measurement System (HMS-5300), double beam spectrophotometer (UV-3600). Experimental Procedures and Operational Workflow:

4. Experimental Procedures and Operational Workflow: The substrates were cleaned and prepared before deposition. The deposition conditions were controlled for VO2 and Cu50Zr50 layers. The thickness was controlled by deposition time and verified by a step profiler.

5：Data Analysis Methods:

XRD for crystallographic properties, AFM and SEM for surface morphology, Hall Effect Measurement System for MIT properties, and spectrophotometer for optical properties.