研究目的
To characterize the chemical and electrochemical stability of ALD-deposited AZO TCO thin films protected by a 10nm TiO2 overlayer and demonstrate their use in electrochemical water splitting applications.
研究成果
The addition of a 10 nm TiO2 protection layer significantly enhances the chemical and electrochemical stability of ALD-deposited AZO thin films, making them suitable for use in a wide range of electrochemical environments, including water splitting applications. This strategy expands the potential for using ALD to fabricate conformal, chemically stable TCOs on complex, three-dimensional substrates.
研究不足
The failure of the layered AZO/TiO2 TCO was the result of the dissolution of the AZO layer through pinholes or other defects in the ultra-thin TiO2 layer. Increasing the thickness of the TiO2 layer may improve stability but could also increase resistivity.
1:Experimental Design and Method Selection:
The study utilized atomic layer deposition (ALD) to fabricate AZO and TiO2 thin films. The chemical and electrochemical stability of these films was characterized through UV-Vis transmission spectroscopy, SEM, XPS, XRD, and resistivity measurements.
2:Sample Selection and Data Sources:
Samples were prepared on n+-Si wafers, p-Si wafers with a thermal oxide layer, and glass slides.
3:List of Experimental Equipment and Materials:
Equipment included a FEI Nova Nanolab SEM, PHI Versaprobe XPS instrument, Rigaku Mini-Flex II XRD, Veeco 4-Point Resistivity Meter, and Jasco V-780 spectrometer. Materials included diethylzinc, trimethylaluminum, H2O, and tetrakis(dimethylamido)titanium.
4:Experimental Procedures and Operational Workflow:
ALD films were deposited on cleaned substrates. The chemical stability was tested by submerging samples in acidic or basic solutions and measuring UV-Vis transmission over time. Electrochemical stability was assessed through cyclic voltammetry and chronopotentiometry.
5:Data Analysis Methods:
Data analysis included comparing UV-Vis spectra over time to assess dissolution rates, measuring sheet resistance, and analyzing electrochemical performance.
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