研究目的
Investigating the deposition of microstructured silicon oxide (SiOx) thin films on glass and metal substrates using atmospheric-pressure thermal microplasma jet from HMDSN and HMDSO precursors.
研究成果
Microstructured SiOx thin films composed of string-like products were successfully deposited using atmospheric-pressure thermal microplasma jet. The study provides insights into the conditions favoring the formation of bent and linear string-like products and their microstructures.
研究不足
The mechanism for the formation of the microstructures is not fully understood. The study is limited to the specific conditions of atmospheric-pressure thermal microplasma jet deposition.
1：Experimental Design and Method Selection:
Atmospheric-pressure thermal microplasma jet was used for depositing SiOx thin films from HMDSN and HMDSO precursors.
2：Sample Selection and Data Sources:
Glass and metal substrates were used. The influence of various surface microstructures of substrates on the formation of SiOx microstructure was investigated.
3：List of Experimental Equipment and Materials:
Argon gas, HMDSN, HMDSO, glass and metal substrates, mullite nozzle, tungsten wire, VHF power source, SEM, AFM, EDS.
4：Experimental Procedures and Operational Workflow:
The plasma jet was irradiated onto the substrates under varying conditions of precursor concentration, gas flow rate, irradiation time, and nozzle-substrate distance.
5：Data Analysis Methods:
SEM and AFM were used for microstructure observation, and EDS for elemental analysis.
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