研究目的
To describe the fabrication of thin films of phase-pure 1T’ MoTe2 using pre-deposited molybdenum and electrodeposited tellurium layers, at the relatively low temperature of 450?C, and to investigate their application as catalysts for the hydrogen evolution reaction.
研究成果
The fabrication method allows for growth of large-area MoTe2 films directly on inert, conductive PyC substrates without further processing. The films show encouraging HER results and offer inherent scalability. The growth of 1T’ MoTe2 was successful at temperatures as low as 450?C, which lowers the thermal budget of the synthesis and allows for potential back-end-of-line integration with silicon-based chips.
研究不足
The films show a 40% drop in current density over a period of 190 minutes in chronoamperometry tests, which may be due to mechanical damage caused by H2 bubble formation. The growth of the 2H phase of MoTe2 was not observed at any temperature, which may limit applications requiring semiconducting properties.
1:Experimental Design and Method Selection:
The fabrication of MoTe2 thin-films was carried out in an enclosed crucible by the reaction of pre-deposited Mo metal films with electrodeposited Te. Electrodeposition was used as a method of spatially controlling and directing the Te deposition on each sample.
2:Sample Selection and Data Sources:
A film of Mo was deposited on a silicon wafer with 300 nm silicon oxide using a Temescal FC2000 electron-beam evaporation system.
3:List of Experimental Equipment and Materials:
Temescal FC2000 electron-beam evaporation system, WITec Alpha 300R Raman spectrometer, Omicron XM1000 MkII X‐ray source, Karl Zeiss Supra SEM, JEOL JEM-2100 TEM, Bruker Multimode 8 AFM, Bruker D8 Discover XRD.
4:Experimental Procedures and Operational Workflow:
The pulsed Te deposition consisted of 10 ms pulses with 50 ms gaps, at -
5:3 V with respect to the reference electrode. Following the Te deposition, the films were converted to MoTe2 in an ATV PEO 604 quartz furnace at 450?C. Data Analysis Methods:
Raman spectra were analyzed using a WITec Alpha 300R with a 532 nm excitation laser. XPS spectra were analyzed using CasaXPS software. SEM and TEM images were analyzed for morphology and crystal structure.
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WITec Alpha 300R
Alpha 300R
WITec
Raman spectrometer for characterizing MoTe2 films.
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Karl Zeiss Supra
Supra
Karl Zeiss
SEM for imaging film morphology.
-
JEOL JEM-2100
JEM-2100
JEOL
TEM for analyzing crystal structure.
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Bruker Multimode 8
Multimode 8
Bruker
AFM for measuring film roughness.
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Bruker D8 Discover
D8 Discover
Bruker
XRD for confirming film phase.
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Temescal FC2000
FC2000
Temescal
Electron-beam evaporation system for depositing Mo films.
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Omicron XM1000 MkII
XM1000 MkII
Omicron
X‐ray source for XPS analysis.
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ATV PEO 604
PEO 604
ATV
Quartz furnace for converting films to MoTe2.
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