研究目的
Investigating a novel method of nanoscale chemical etching for noble metals using substrate-assisted chemical etching.
研究成果
The study demonstrates a novel method for nanoscale etching of noble metals using substrate-assisted chemical etching, which is efficient and highly localized. This method has potential applications in the fabrication of plasmonic and photonic devices.
研究不足
The method is sensitive to the type of substrate and the presence of N radicals, limiting its applicability to certain metal-nitride heterostructures.
1：Experimental Design and Method Selection:
The study utilized electron beam-induced etching (EBIE) with H2O as a precursor gas to achieve nanoscale patterning of silver nanowire-nitride heterostructures.
2：Sample Selection and Data Sources:
Ag nanowires were dropcast onto various substrates including hBN, AlN, GaN, and oxide-covered Si.
3：List of Experimental Equipment and Materials:
A variable pressure FEI Nova NanoSEM was used for EBIE experiments.
4：Experimental Procedures and Operational Workflow:
The chamber was filled with a low pressure of gas, and the Ag nanowires were located using a gas cascade magnetic field assisted detector. EBIE was performed using a 15keV beam at currents of
5：47-6 nA. Data Analysis Methods:
Compositional analysis was conducted by Energy Dispersive X-ray (EDX) spectroscopy.
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