研究目的
To develop a dual chamber system integrated with atomic layer deposition (ALD) and atomic force microscopy (AFM) for the successive monitoring of nanoparticles to thin film growth process.
研究成果
The integrated AFM/ALD system is a powerful tool for monitoring the thin film preparation and characterization. It allows for the successive monitoring of thin film growth from initial nanoparticle nucleation to continuous film formation under controlled environments.
研究不足
The system is limited to the monitoring of thin film growth and surface morphology changes under controlled environments. The high temperature treatment and controlled gas environment are required for certain experiments.
1：Experimental Design and Method Selection:
The system is composed of two main chambers: the ALD reaction chamber and the AFM test chamber. The ALD reaction chamber is used for sample fabrication, and the AFM test chamber is used for surface morphology measurement. A magnetic transmission rod enables sample transferring between the ALD and the AFM test chambers without breaking the vacuum.
2：Sample Selection and Data Sources:
Platinum (Pt) nanoparticles/films are demonstrated as target materials to be grown via ALD.
3：List of Experimental Equipment and Materials:
The system includes an ALD reaction chamber, an AFM test chamber, a magnetic transmission rod, and a sample stage with accurate location pinholes.
4：Experimental Procedures and Operational Workflow:
The samples are fabricated in the ALD chamber and then transferred to the AFM test chamber for surface morphology measurement. The surface morphology is monitored successively during the deposition.
5：Data Analysis Methods:
The surface roughness, particle density, and void percentage are calculated to evaluate the growth behavior of thin films.
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