研究目的
To overcome the challenges of low voltage handling capability and additional fabrication steps in AOS V-TFDs by exploiting in situ reactions of molybdenum during the solution-process deposition of amorphous zinc tin oxide film.
研究成果
The study successfully demonstrated a novel method to fabricate high-voltage V-TFDs and TFTs simultaneously using a solution process that exploits in situ redox and diffusion of molybdenum. This approach enhances the voltage handling capability of V-TFDs and opens new routes for low-cost, large-area thin-film circuitry with embedded power management.
研究不足
The study focuses on the specific system of Mo and amorphous zinc tin oxide, and the generalizability to other materials or systems is not explored. The process temperature of 520°C may limit compatibility with some substrates.
1:Experimental Design and Method Selection:
The study utilized a solution-process deposition method for amorphous zinc tin oxide film, exploiting in situ reactions of molybdenum to form rectifying contacts and enhance voltage handling capability.
2:Sample Selection and Data Sources:
Heavily doped n-type Si substrates were used with sputtered Mo electrodes.
3:List of Experimental Equipment and Materials:
Equipment included a spin-coater for film deposition, sputtering system for electrode fabrication, and semiconductor parameter analyzers for electrical characterization. Materials included zinc acetate dihydrate, tin(II) acetate, and molybdenum.
4:Experimental Procedures and Operational Workflow:
The process involved spin-coating Zn-Sn-O layers, patterning via wet etch, and sputtering top Mo electrodes. Electrical characterization was performed using semiconductor parameter analyzers.
5:Data Analysis Methods:
Electrical characteristics were analyzed to evaluate diode performance, including current-voltage (J-V) and capacitance-voltage (C-V) measurements.
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