研究目的
To synthesize nano-structured gold thin films over Silicon dioxide (SiO2) coated on Silicon(Si) Substrate using three deposition techniques and to observe their optical properties using spectroscopic ellipsometry.
研究成果
Thin films synthesized using different deposition techniques showed fcc nature with grain sizes more uniform for PLD technique. Optical measurements indicated differences in dielectric constants due to different microstructures resulting from different synthesis routes. Future directions include electrical resistivity measurements and optical investigations at varying temperatures.
研究不足
The study did not consider the strain component in fitting the XRD pattern, which could affect the grain size determination. Future work could include electrical resistivity measurements and optical investigations at high and low temperatures.
1：Experimental Design and Method Selection:
The study involved synthesizing gold thin films using DC Sputtering, Pulsed DC Sputtering, and Pulsed Laser Deposition (PLD) techniques. Optical properties were measured using spectroscopic ellipsometry.
2：Sample Selection and Data Sources:
The substrate was P type with <100> orientation, 525 +/- 25 μm thickness, and 100 +/- 0.5 mm diameter, cleaned using the RCA procedure.
3：5 mm diameter, cleaned using the RCA procedure.
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: SOPRA ESVG rotating polarizer type spectroscopic ellipsometer was used for measurements in the energy range1.4–5.5 eV.
4：4–5 eV.
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Films were deposited over 200nm SiO2 coated on c-Si. Ellipsometric parameters were measured at an angle of incidence of 75o.
5：5o.
Data Analysis Methods:
5. Data Analysis Methods: The optical pseudo-dielectric function was deduced from ellipsometric parameters using a specific relation. Data was analyzed using the Drude and Lorentz models.
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