研究目的
Investigating the photoionization processes of titanium oxo clusters doped with extended aromatic structures to decrease their ionization energy and stabilize the resulting radical cations for EUV lithography applications.
研究成果
Doping the organic shell of Ti-based metal oxo clusters with extended aromatic structures effectively decreases their photoionization threshold and stabilizes the ionized species, highlighting their potential as EUV photoresists. The synthetic versatility of these materials allows for the tuning of their reactivity towards EUV light.
研究不足
The study is limited to the gas phase and may not fully represent the behavior of these materials in solid-state EUV lithography applications. The computational models simplified the pivalate ligands to acetate for efficiency, which may not accurately reflect all properties of the actual compounds.
1：Experimental Design and Method Selection:
The study involved doping the organic shell of Ti-based metal oxo clusters with extended aromatic structures to modify their HOMO levels. The photodissociation and photoionization were investigated using VUV-MS.
2：Sample Selection and Data Sources:
Ti8O8Piv16 MOC was doped with phenylcarbazole-, bis-(thienyl)-, and anthracenyl-based carboxylate ligands.
3：List of Experimental Equipment and Materials:
A linear quadrupolar ion trap mass spectrometer coupled to the DESIRS beamline at SOLEIL synchrotron radiation facility was used.
4：Experimental Procedures and Operational Workflow:
The doped clusters were synthesized through ligand exchange reactions, characterized, and then subjected to VUV-MS to study their photoionization.
5：Data Analysis Methods:
The data was analyzed to determine the photoionization energy threshold and the stability of the ionized species.
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