研究目的
To investigate the interaction of Triton X-n surfactants with varying hydrophilic chain lengths in potassium hydroxide for the formation of 45? silicon (110) surfaces, aiming to understand molecular interactions and optimize surface quality for infrared applications in micro-optomechanical systems.
研究成果
Longer Triton chain lengths (e.g., X-405) produce smoother (110) surfaces but slower etch rates and rougher (100) surfaces, while shorter Triton (X-45) results in rougher (110) but smoother (100) surfaces. Optical measurements confirmed higher reflectivity for longer Triton-treated surfaces. A broadband MIR mirror with 73% efficiency was achieved using a Si-SiO2 DBR, demonstrating potential for cost-effective KOH-based etching in infrared applications.
研究不足
The study is limited to specific Triton surfactants and KOH solutions; results may not generalize to other surfactants or etchants. Native oxide formation could affect contact angle measurements. The optical measurements were conducted at specific wavelengths (1.55 μm and 3.80 μm), and the DBR performance had discrepancies between simulation and experiment due to material properties.
1：Experimental Design and Method Selection:
The study involved wet etching of silicon wafers in KOH solutions with Triton X-n surfactants (X-45, X-100, X-405) at 80°C to form 45? slanted (110) planes. Methods included contact angle measurements, AFM for surface roughness, and optical reflectivity tests.
2：Sample Selection and Data Sources:
P-doped Si (100) wafers were used, thermally oxidized and patterned with RIE. Samples were etched in freshly prepared solutions with varying Triton concentrations (0-1000 ppm).
3：List of Experimental Equipment and Materials:
Equipment included a glass vessel for etching, temperature probe, stirrer, AFM, contact angle goniometer, SEM, PECVD system (ASM P5000), sputtering system (Denton), lasers (1.55 μm and 3.80 μm), objective lenses (20X DIN from Edmund Optics, LFO-5-6 from Innpho), photodetectors (InGaAs, thermopile). Materials included KOH pellets (Kanto), Triton X-n surfactants, deionized water.
4：55 μm and 80 μm), objective lenses (20X DIN from Edmund Optics, LFO-5-6 from Innpho), photodetectors (InGaAs, thermopile). Materials included KOH pellets (Kanto), Triton X-n surfactants, deionized water.
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Wafers were etched in stirred KOH-Triton solutions at 80°C for 2 hours, rinsed, dried, and characterized. Contact angle measurements were performed on cleaned Si surfaces. Optical measurements involved aligning fibers and lenses to measure reflected power.
5：Data Analysis Methods:
Etch rates were calculated from SEM images, surface roughness from AFM, and optical efficiency from power measurements using detectors. Statistical analysis was implied from repeated experiments.
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