研究目的
To develop a novel hybrid removal method for ultrathick SU-8 micromolds in ECF micropumps fabrication to achieve higher-aspect-ratio TPSEs.
研究成果
The hybrid removal method effectively removes ultrathick SU-8 micromolds, enabling fabrication of higher-aspect-ratio TPSEs up to 970 μm height with improved pro?les and enhanced ECF micropump performance in terms of output pressure and flow rate. This approach facilitates easier fabrication of metallic microstructures in MEMS applications.
研究不足
The CO2 laser engraving leaves residues near TPSEs due to Gaussian energy distribution and re?ection from nickel surfaces, requiring additional plasma cleaning. The method may not be directly applicable to all substrate types without optimization, and the plasma etching rate is relatively slow for very thick layers.
1:Experimental Design and Method Selection:
The study proposes a hybrid method combining CO2 laser engraving for bulk SU-8 removal and O2/CF4 plasma etching for residue cleaning. The rationale is to achieve fast, non-swelling, and complete removal without damaging electroplated microstructures.
2:Sample Selection and Data Sources:
SU-8 micromolds with thicknesses of 620 μm and 1100 μm were fabricated using UV-LIGA process on glass substrates with titanium and gold seed layers.
3:List of Experimental Equipment and Materials:
Equipment includes a CO2 laser system (Model L-908PC, IIDA KOGYO Co., Ltd.), O2/CF4 plasma etcher, surface profiler (Veeco Dektak 150), SEM for imaging, and materials include SU-8 photoresist, nickel for electroforming, and ECF fluid (FF-909EHA2).
4:2). Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Steps involve fabricating SU-8 micromolds via spin-coating, UV exposure, and development; electroforming nickel TPSEs; removing SU-8 using CO2 laser engraving (varying power, speed, and pass numbers) followed by O2/CF4 plasma etching; and characterizing the TPSEs and ECF micropump performance.
5:Data Analysis Methods:
Ablation thickness was measured with a surface profiler, and output performance (pressure and flow rate) was evaluated using pressure sensors and digital balances, with statistical analysis of pro?le parameters.
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Surface Profiler
Dektak 150
Veeco
Used to measure the thickness change of SU-8 layer after laser ablation.
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CO2 Laser System
L-908PC
IIDA KOGYO Co., Ltd.
Used for engraving and ablating SU-8 photoresist in the hybrid removal process.
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Pressure Sensor System
AP-V82 and AP-13S
Keyence Co. Ltd.
Used to measure the output pressure of ECF micropumps.
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Digital Electric Balance
EK-610i
A&D Co. Ltd.
Used to measure the mass of ECF fluid for flow rate calculation.
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High DC Voltage Amplifier
Matsusada Precision Inc.
Used to provide high voltage to the ECF micropump.
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ECF Fluid
FF-909EHA2
New Technology Management Co., Ltd.
Used as the working fluid in the ECF micropump experiments.
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SU-8 Photoresist
MicroChem Corp.
Used as the micromold material for fabricating TPSEs.
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KMPR Photoresist
KMPR 1035
MicroChem Corp.
Previously used as micromold material, mentioned for comparison.
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Remover K and Neutralizer K
MicroChem Corp.
Tested as a chemical remover for SU-8, but found ineffective in this study.
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3D-Geometry Measurement Microscope
VR 3000
Keyence
Used to evaluate the profile of fabricated TPSEs, including tip radius and sidewall perpendicularity.
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