研究目的
To develop a strategy for incorporating a Ru/C composite onto a novel nanoporous electrode surface with low noble metal loading and improved stability for water oxidation.
研究成果
The nanoporous Ru/C electrodes exhibit enhanced stability and competitive current densities at low overpotentials for water oxidation, with optimized performance at 13 μm pore length. This approach minimizes noble metal loading and improves corrosion resistance, suggesting potential for replacing more expensive catalysts like iridium in some applications.
研究不足
The study is conducted at pH 4 to ensure stability of components; stability and performance may vary at other pH levels. The method may have limitations in scalability or application to other materials.
1：Experimental Design and Method Selection:
The study uses a laser-induced deposition method to coat Ru/C composites on planar and nanoporous substrates. The method involves laser irradiation of Ru3(CO)12 solutions to deposit thin films.
2：Sample Selection and Data Sources:
Planar substrates are microscope cover glasses with ITO coating; nanoporous substrates are anodic alumina templates with varying pore lengths (11-24 μm).
3：List of Experimental Equipment and Materials:
Equipment includes He-Cd laser, SEM (Zeiss Merlin), EDX (JEOL JSM 6400 PC), Raman spectrometer (Horiba Jobin-Yvon LabRam HR 800), XRD (Bruker D8 Advance), XPS (PHI Quantera II), potentiostats (Gamry Interface 1000). Materials include Ru3(CO)12, 1,2-dichloroethane, aluminum plates, ITO sputter target.
4：0). Materials include Ru3(CO)12, 1,2-dichloroethane, aluminum plates, ITO sputter target. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: For planar samples, laser irradiation for 30 min; for nanoporous samples, anodization of Al, laser deposition for 15 min, sputter-coating of ITO. Electrochemical measurements (CV, LSV, steady-state electrolysis) at pH
5：Data Analysis Methods:
Data analyzed using SEM, EDX, Raman, XRD, XPS for characterization; electrochemical data analyzed for current densities and stability.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容-
SEM
Zeiss Merlin
Zeiss
Used for scanning electron microscopy to characterize the morphology of the deposited films.
-
EDX spectrometer
JEOL JSM 6400 PC
JEOL
Used for energy-dispersive X-ray spectroscopy to analyze elemental composition.
-
XRD diffractometer
Bruker D8 Advance
Bruker
Used for X-ray diffraction to analyze the crystal structure of the samples.
-
Centrifuge
SIGMA 2-16P
SIGMA
Used to centrifuge the precursor solution to remove undissolved components.
-
Thermal camera
Thermovision Ti32
Fluke
Used to monitor temperature during laser deposition.
-
He-Cd laser
Plasma He-Cd laser
Plasma
Used for laser-induced deposition of Ru/C films by irradiating the precursor solution.
-
Raman spectrometer
Horiba Jobin-Yvon LabRam HR 800
Horiba Jobin-Yvon
Used for Raman spectroscopy to study the chemical composition of the samples.
-
XPS system
PHI Quantera II
PHI
Used for X-ray photoelectron spectroscopy to study the surface chemistry and oxidation states.
-
Potentiostat
Gamry Interface 1000
Gamry
Used for electrochemical measurements including cyclic voltammetry, linear sweep voltammetry, and steady-state electrolysis.
-
Furnace
P330
Nabertherm
Used for annealing the ITO-coated substrates.
-
Sputter coater
Torr International Inc.
Used for sputter-coating ITO onto substrates.
-
Laser cutter
GCC LaserPro Spirit LS
GCC
Used to cut samples into smaller areas.
-
登录查看剩余10件设备及参数对照表
查看全部
