研究目的
To investigate the performance of optically transparent 4 × 2 microstrip patch antenna arrays operating at 60 GHz made from double-sided micrometric mesh metal layers, focusing on the effect of mesh processing of the ground plane and comparing with an opaque counterpart.
研究成果
The study demonstrates that adding the radiating layer footprint into the mesh ground plane reduces resonance frequency shift and improves gain in transparent antenna arrays at 60 GHz. Misalignment up to 100 μm has negligible impact on microwave performance but affects optical transparency. The approach provides a viable method for high-performance transparent antennas with applications in IoT and 5G.
研究不足
The technology has limitations at higher frequencies (e.g., 100 GHz and above) where reduced mesh pitch is needed, which decreases optical transparency. Misalignment up to 100 μm is tolerable but affects local optical transparency. The UV/Visible beam size limits measurement of mesh radiating layer transparency.
1：Experimental Design and Method Selection:
The study involves designing and fabricating transparent and opaque antenna arrays using microstrip technology on fused quartz substrates. Numerical simulations are performed using CST Microwave Studio software to predict performance.
2：Sample Selection and Data Sources:
Antenna arrays are fabricated with specific mesh parameters (pitch and strip width) for the radiating layer and ground plane. Measurements include optical transparency using a UV/Visible spectrophotometer and microwave performance (reflection coefficient, radiation patterns, gain).
3：List of Experimental Equipment and Materials:
Equipment includes a UV/Visible spectrophotometer, RF sputtering system, photolithography setup (mask aligner), wet etching tools, and measurement setups for microwave characterization. Materials include fused quartz substrates, silver films, titanium underlayers, and photoresists.
4：Experimental Procedures and Operational Workflow:
Fabrication involves depositing metal layers via RF sputtering, patterning using photolithography and wet etching, aligning layers with a mask aligner, and measuring optical and microwave properties.
5：Data Analysis Methods:
Data is analyzed by comparing simulated and measured results, using equations for optical transparency and sheet resistance, and statistical comparisons of gain and frequency shifts.
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