研究目的
To control the colloidal arrangement between crystal and glass by employing two different sizes of silica particles with repulsive interparticle potential to tune the optical properties for structural coloration.
研究成果
The study demonstrates a simple method to control colloidal ordering between crystalline and amorphous states using bidisperse silica particles with repulsive potential, enabling tuning of optical properties for structural coloration. Reflectivity and peak width can be adjusted based on size contrast and mixing ratio, with applications in color-tunable materials. Future work could explore other particle systems and independent control of optical parameters.
研究不足
The reflectivity and normalized FWHM are coupled and cannot be independently controlled; the method is limited to specific size contrasts and mixing ratios, and may not be applicable to other particle types or conditions.
1：Experimental Design and Method Selection:
The study uses bidisperse silica particles in a photocurable resin to form nonclose-packed arrays, leveraging repulsive interparticle potential to control ordering. Theoretical models include Bragg's diffraction and Maxwell-Garnet average for refractive index calculations.
2：Sample Selection and Data Sources:
Silica particles with diameters of 140, 177, 202, and 238 nm are synthesized and mixed in various ratios. Volume fraction is fixed at
3：List of Experimental Equipment and Materials:
Silica particles, poly(ethylene glycol) phenyl ether acrylate (PEGPEA), photoinitiator Darocur 1173, ethanol, glass substrates, polyimide tape, ultraviolet light source (Innocure 100N), optical microscope (Eclipse L150), spectrometer (HR 4000CG-UV-NIR), SEM (S-4800), oxygen plasma etcher (PDC-001).
4：1). Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Particles are dispersed in PEGPEA with photoinitiator, ethanol is evaporated, dispersion is infiltrated between glass substrates, exposed to UV to polymerize, and films are characterized using microscopy and spectroscopy. Cross-sections are prepared and observed with SEM.
5：Data Analysis Methods:
Reflectance spectra are measured, peak wavelengths, reflectivity, and FWHM are analyzed. Statistical consistency is checked for normalized values.
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PEGPEA
MW 323
Sigma-Aldrich
Photocurable resin used as the dispersion medium and matrix for embedding silica particles.
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SEM
S-4800
Hitachi
Used to observe cross-sections of photonic films after treatment.
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Silica particles
Various diameters (e.g., 140 nm, 177 nm, 202 nm, 238 nm)
Synthesized in-house using modified St?ber method
Used as colloidal particles to form arrays for structural coloration experiments.
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Darocur 1173
Not specified
Ciba Chemical
Photoinitiator added to PEGPEA for polymerization under UV light.
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Ethanol
Not specified
Not specified
Solvent used for dispersing silica particles before evaporation.
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Polyimide tape
Kapton
Not specified
Used as a spacer with thickness of 60 μm between glass substrates for film fabrication.
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Ultraviolet light source
Innocure 100N
Lichtzen
Used to expose the dispersion to UV light for polymerization of PEGPEA.
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Optical microscope
Eclipse L150
Nikon
Used to observe photonic films in reflection mode.
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Spectrometer
HR 4000CG-UV-NIR
Ocean Optics Inc.
Mounted on the microscope to measure reflectance spectra.
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Oxygen plasma etcher
PDC-001
Harrick plasma
Used to etch polymer matrix and disclose buried silica particles for SEM observation.
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