研究目的
Fabricating v-shaped nano-slit arrays in silicon substrates at wafer scale for potential applications in bio-molecule analysis.
研究成果
The method successfully fabricated v-shaped nano-slit arrays with a minimum feature size of 5 nm, demonstrating potential for bio-molecule analysis applications. Future work should focus on improving uniformity and scalability.
研究不足
The process may be limited by the uniformity of etching across the wafer and the resolution of the mask design. Optimization is needed for larger-scale production and integration with other microsystems.
1：Experimental Design and Method Selection:
A three-step wet anisotropic etching method was employed, utilizing a color-feed mechanism for precise control.
2：Sample Selection and Data Sources:
Silicon wafers were used as substrates.
3：List of Experimental Equipment and Materials:
Silicon wafers, wet etching solutions (e.g., KOH for anisotropic etching), and mask materials.
4：Experimental Procedures and Operational Workflow:
The process involved mask application, anisotropic etching in KOH solution at 30°C, and careful removal to form v-shaped nano-slits.
5：Data Analysis Methods:
Feature size and uniformity were analyzed using microscopy techniques.
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