1：Experimental Design and Method Selection:

The study compares thermal annealing and photochemical DUV treatment for removing organic ligands (OAm and PVP) from nanomaterials. Photochemical treatment uses low-pressure mercury lamps (emitting 253.7 nm and 184.9 nm) or RF discharge excimer lamps (emitting 172 nm) under nitrogen atmosphere to cleave organic bonds without high heat.

2：7 nm and 9 nm) or RF discharge excimer lamps (emitting 172 nm) under nitrogen atmosphere to cleave organic bonds without high heat. Sample Selection and Data Sources:

2. Sample Selection and Data Sources: Nanomaterials include Ag nanoparticles (capped with OAm or PVP), Ag nanowires (capped with PVP), and Bi2Se3 nanosheets (capped with PVP), synthesized using chemical methods. Films are deposited on silicon wafer substrates via spin-coating or spray-coating.

3：List of Experimental Equipment and Materials:

Equipment includes low-pressure mercury lamp (UV-1, Samco Co.), RF discharge excimer lamp (EX-mini L12530, Hamamatsu Photonics K.K.), field-emission scanning electron microscope (SIGMA, Carl Zeiss), Raman spectrometer (LabRam Aramis, Horiba), X-ray photoelectron spectrometer (Thermo U. K. K-alpha), semiconductor parameter analyzer (Agilent 4155C). Materials include reagents from Sigma-Aldrich (e.g., AgNO3, PVP, oleylamine, ethylene glycol).

4：Experimental Procedures and Operational Workflow:

Nanomaterials are synthesized, deposited as thin films, and treated with thermal annealing (various temperatures for 30 min) or DUV/excimer irradiation (various durations at 50-60°C). Morphology and electrical properties are characterized using SEM, Raman spectroscopy, XPS, and sheet resistance measurements via Van der Pauw method.

5：Data Analysis Methods:

Sheet resistance data is analyzed to compare conductivity improvements. Raman and XPS spectra are used to confirm ligand removal. Statistical analysis is not explicitly mentioned, but data is presented with standard measurements.