研究目的
To develop and characterize cavity-resonator-integrated guided-mode resonance filters (CRIGFs) for use in compact wavelength division multiplexing (WDM) light sources, focusing on aperture miniaturization, wavelength multiplexing, and optimization of reflective layers to maximize waveguide-coupled lasing power.
研究成果
Four CRIGFs were successfully fabricated and characterized, demonstrating reflectances of about 30% and output efficiencies higher than 0.5%. Theoretical investigations confirmed that integrating a reflective layer with an optimized optical buffer layer thickness minimizes CRIGF transmittance and maximizes waveguide-coupled laser power, supporting the potential for compact multi-wavelength light sources.
研究不足
The reflectance and output efficiencies obtained experimentally (about 30% and higher than 0.5%) were lower than theoretical predictions (30% and 20%), likely due to propagation losses from waveguide roughness (estimated at 3 dB/mm) and fabrication errors causing wavelength shifts of 5 nm. The aperture size of 10 μm may need to be smaller for practical applications with stripe lasers.
1：Experimental Design and Method Selection:
The study involves designing CRIGFs with waveguide cavities formed by distributed Bragg reflectors (DBRs) of different reflectances. Theoretical models are used to calculate effective refractive indices, grating periods, radiation decay factors, and coupling coefficients. Experimental methods include fabrication and characterization of CRIGFs.
2：Sample Selection and Data Sources:
Four CRIGFs are fabricated with resonance wavelengths of 1520, 1535, 1550, and 1565 nm, using a GeO2:SiO2 guiding core layer and Si-N cladding layer on a SiO2 glass substrate. Data on reflectance and output efficiencies are measured.
3：List of Experimental Equipment and Materials:
Materials include GeO2:SiO2 (refractive index 1.526), Si-N (refractive index 1.973), SiO2 glass substrate (refractive index 1.444), and reflective layers such as Si-N, TiO2, and Si. Equipment for fabrication (e.g., EB lithography) and characterization (e.g., optical measurement setups) are implied but not specified.
4：526), Si-N (refractive index 973), SiO2 glass substrate (refractive index 444), and reflective layers such as Si-N, TiO2, and Si. Equipment for fabrication (e.g., EB lithography) and characterization (e.g., optical measurement setups) are implied but not specified.
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: CRIGFs are designed with specific grating periods, DBR lengths, and phase-adjusting gaps. Fabrication involves depositing layers and forming gratings. Measurements include vertical-incident wave reflectance and guided-wave output efficiency.
5：Data Analysis Methods:
Data analysis involves calculating waveguide-coupled laser power using assumed parameters for InGaAsP/InP lasers, and optimizing buffer layer thickness to minimize transmittance and maximize output power.
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