1：Experimental Design and Method Selection:

AZO thin films were deposited using RF sputtering at room temperature and post-treated with H2 plasma at varying durations. Optical constants were characterized using a varied-angle spectroscopic ellipsometer with a Drude-Lorentz dispersion model for data fitting.

2：Sample Selection and Data Sources:

Samples were prepared on fused glass or Si (100) substrates. Data were acquired from ellipsometry, Hall effect measurements, UV-vis-NIR spectrophotometry, XPS, AFM, SEM, and TEM analyses.

3：List of Experimental Equipment and Materials:

Equipment includes an RF sputtering system, PECVD system, Hall effect measurement system, UV-vis-NIR spectrophotometer, spectroscopic ellipsometer, XPS spectrometer, AFM, SEM, and TEM. Materials include AZO target, argon gas, hydrogen gas, and substrates.

4：Experimental Procedures and Operational Workflow:

Deposition of AZO films via RF sputtering, followed by H2 plasma treatment at specified conditions (10 W, 200 °C, varying times). Characterization involved electrical, optical, and structural analyses using the listed equipment.

5：Data Analysis Methods:

Data were analyzed using Drude-Lorentz model fitting for ellipsometry, Tauc's formula for band gap calculation, and standard statistical methods for other measurements.