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Nitrogen-Doped Titanium Dioxide Thin Films Formation on the Surface of PLLA Electrospun Microfibers Scaffold by Reactive Magnetron Sputtering Method
摘要： Nitrogen-doped thin titanium dioxide films formed by the reactive magnetron sputtering method on the surface of PLLA electrospun microfibers scaffold were investigated. It was shown that the chemical composition of the films is shifting from titanium dioxide (TiO2) composites saturated with C–NH, C=N, N–C=N and HN–C=O compounds to solid solutions of titanium oxides (TixOy) and titanium oxynitrides (TiOxNy) with the increased time of the treatment. An empirical model describing changes in the chemical composition of the surface due to the treatment was proposed. It was shown that the modification of the PLLA microfibers scaffolds surface improves cell-scaffold and cell–cell interactions with the highest number of viable adherent cells observed on the scaffold treated for 4 min.
关键词： Scaffolds,Reactive magnetron sputtering,Thin films,Biocompatibility
更新于2025-11-21 11:24:58
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Electrochromic device with Magnetron sputtered Tungsten Oxide (WO<sub>3</sub>) and nafion membrane: performance with varying Tungsten Oxide thickness- A report
摘要： Electrochromics is the emerging technology for energy conservation and indoor climatic control through smart windows. In this study we are reporting four layer electrochromic device: ITO (400nm)/ commercially procured Nafion (183μm) / WO3 (44nm to 200nm)/ ITO (400nm). The active area (A) of the electrochromic devices are 3cm2. The tungsten oxide (WO3) and ITO thin films have been deposited at room temperature (300 K) by reactive DC Magnetron sputtering. The sheet resistance of ITO is 20 ?/□. The “as deposited” WO3 films are amorphous and have high optical transmission (75%- 85%) in the visible spectrum. The optical band gap decreases with increasing thickness of WO3 thin films. The coloration efficiency (CE) of the electrochromic device increases with increasing thickness of the WO3 layer. The CE for the device with WO3 thickness 200 nm is 184 cm2/C: the highest reported so far for a hybrid electrochromic device. The increase in the CE with thickness has been explained (for the first time) by replacing the surface charge density (Q/A) with the volume charge density (Q/A*t) in the coloration efficiency formula derived from the Beer Lambert’s law.
关键词： coloration efficiency,electrochromism,nafion and Magnetron sputtering.,Tungsten oxide
更新于2025-11-19 16:56:35
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Electrochromic Properties of Nanostructured WO <sub/>3</sub> Thin Films Deposited by Glancing‐Angle Magnetron Sputtering
摘要： Tungsten oxide thin films are prepared by glancing-angle reactive magnetron sputtering at room temperature. The surface and cross-section morphologies are characterized by FE-SEM and TEM. The electrochromic properties of the thin films are studied using a three-electrode system in 1 m LiClO4/PC solution. When the glancing angle is kept at 80°, a nanocolumnar structured film is obtained. This nanocolumnar structured film shows a lower driving potential and better stability compared to the dense film. The charge capacity per unit area of the nanocolumnar structured film is determined to be 30.85 mc cm?2. The diffusion rates of injection and detachment of ions are determined to be Din = 6.57 × 10?10 cm2 s?1 and Dde = 6.55 × 10?10 cm2 s?1 under an applied potential of ±1.2 V, respectively. The optical modulation amplitude of the nanocolumnar structured film reaches 65% at a wavelength of 600 nm and the optical density is superior to that of the dense film.
关键词： nanostructured,electrochromic,WO3 thin films,glancing angle,magnetron sputtering
更新于2025-11-14 17:03:37
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Obtainment of Stabilized Zirconium Dioxide via the High-Frequency Magnetron Sputtering of a Metallic Target
摘要： The influence of the yttrium concentration on the structure of coatings prepared via the high-frequency magnetron sputtering of a metal target is investigated. The results of coating deposition in pure argon and a mixed (Ar + O2), reactive medium are discussed. It is demonstrated that a nonequilibrium body-centered-cubic solid solution based on zirconium with an extended homogeneous region (up to 16 at % Y) is formed under the condition that a target is sputtered in pure argon. During reactive-coating deposition, the formation of cubic or tetragonal zirconium dioxide is generated depending on the yttrium concentration. The tetragonal structure is created if the yttrium concentration is 8 at %. It is found that the obtained tetragonal zirconium dioxide is thermally stable both in terms of structure and in morphology upon heat treatment in air at 1100°C for 11 h.
关键词： zirconium dioxide,magnetron sputtering,nanostructured film,composite,coating
更新于2025-11-14 15:13:28
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Optimal target sputtering mode for aluminum nitride thin film deposition by high power pulsed magnetron sputtering
摘要： Low surface roughness, low residual stress, and (002) textured aluminum nitride (AlN) thin films are favored for applications in microelectronic and optoelectronic devices. In this paper, AlN thin films were deposited by reactive high power pulsed magnetron sputtering (HPPMS). The effect of aluminum target sputtering mode and sputtering power on thin film residual stress, crystalline structure, surface roughness, and morphology of AlN thin films was studied. The results indicate that, with Al target sputtering mode transfer from metallic mode to transitional and compound modes, respectively, the number of Al species decrease, and ion-to-neutral ratio of Al species increase. Comparing the AlN thin film deposited in compound mode with that deposited in transitional mode, the latter exhibited lower surface roughness and residual stress. In addition, AlN thin film with (002) texture and lower residual stress is obtained by increasing sputtering power in transitional mode. For fabricating AlN film via reactive HPPMS with a particular (002) texture, low surface roughness, and residual stress, sputtering the target in the transitional mode with high sputtering power is optimal.
关键词： Aluminum nitride,Microstructure,Texture,High power pulsed magnetron sputtering,Sputtering modes,Sputtering power
更新于2025-09-23 15:23:52
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Tuning the excitonic properties of ZnO:Sn thin films
摘要： The effects of Sn doping, deposition temperature, and post-annealing treatment on the excitonic behavior of ZnO:Sn (SZO) thin films deposited by dc-unbalanced magnetron sputtering have been studied. Sn doping induces the decrease of grain size and promotes the formation of oxygen vacancy-related trap states as indicated by A1 LO mode in Raman spectra and green emission in photoluminescence spectra. Using a critical point analysis of the dielectric functions from spectroscopic ellipsometry data analysis, Sn doping blueshifts the excitonic absorption and decreases the exciton lifetime via screening the electron-hole Coulomb interaction. By varying the deposition temperature from room temperature up to 300 °C (SZO-3), there is no change in excitonic absorption. Then, annealing of SZO-3 at 600 °C under oxygen environment (SZO-6) strongly improves the excitonic absorption as well as its lifetime. Critical point analysis on SZO-6 sample clearly reveals the excitonic transition at 3.38 eV and exciton-phonon complexes at 3.66 eV. Thus, the result is important to improve the functionality of doped ZnO with strong excitonic absorption for optoelectronic applications.
关键词： Annealing,Dc-unbalanced magnetron sputtering,Exciton,Thin films,Sn doped ZnO
更新于2025-09-23 15:23:52
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Evolution of microstructures and optical properties of gadolinium oxide with oxygen flow rate and annealing temperature
摘要： In this study, the effects of oxygen flow rate and annealing temperature on Gd2O3 structures and optical properties were systematically analyzed. Gd2O3 films were deposited on both quartz and ZnS substrates by magnetron sputtering and then annealed under vacuum at 700, 800, and 900 (cid:1). Restructure and phase transformation from cubic to monoclinic occur at different temperatures depending on the oxygen flow rate. The optical band gap, which is more sensitive to the annealing temperature than oxygen flow rate changes from 5.32 to 5.65 eV. The refractive index is approximately 1.75 at 550 nm and is adjustable by the oxygen flow rate. The transmittance of the ZnS substrate with Gd2O3 film exceeds 80% and reaches 82% at the 7.5–9.5 μm range. When ZnS is coated on both sides, the transmittance is increased to approximately 90%. Our results indicate that Gd2O3 films are promising new candidates for anti-reflective coatings in the infrared region.
关键词： Rare earths,Infrared materials,Structures,Optical properties,Gadolinium oxide,Magnetron sputtering
更新于2025-09-23 15:23:52
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Thickness-modulated thermochromism of vanadium dioxide thin films grown by magnetron sputtering
摘要： Vanadium dioxide (VO2) films were prepared on soda-lime glass by direct current magnetron sputtering at 320 °C. Effects of film thickness on the microstructure, surface morphology and thermochromic performance of VO2 films were investigated. X-ray diffraction showed that the deposited films have strong preferred orientation of VO2 (011) lattice when the film thickness higher than 102 nm. The calculated grain sizes of VO2 films increased from 16.05 nm to 34.56 nm continuously with the increasing of film thickness. UV/VIS/NIR spectrophotometer showed that the visible transmittance deceased while the infrared transmittance switching efficiency increased as the film thickness increased from 79 nm to 264 nm. Additionally, the optical band gaps of VO2 films were in a range of 1.15 eV–1.40 eV, and the thicker film exhibited the smaller value. Moreover, the results of measured temperature-dependent electrical resistivity of these VO2 films showed that the phase-transition temperature is in a range of 53–60 °C, which is much lower than that of single-crystal VO2 (68 °C). With the film thickness increasing, the metal–semiconductor phase transition becomes more obvious. Overall, films with thickness in the range of 80–100 nm showed comparatively relatively balanced combination of visible transmittance and solar switching efficiency.
关键词： Thermochromic performance,Film thickness,Vanadium dioxide,Magnetron sputtering
更新于2025-09-23 15:23:52
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Diamond like carbon films with embedded Cu nanoclusters deposited by reactive high power impulse magnetron sputtering: Pulse length effects
摘要： In the present study diamond like carbon films with embedded Cu nanoclusters (DLC:Cu films) were deposited by reactive high power impulse magnetron sputtering (HIPIMS). HIPIMS pulse length (pulse on time) effects were considered. The dependence of the chemical composition on pulse length was found. Structure of diamond like carbon matrix of the nanocomposite films studied by Raman scattering spectroscopy has indicated weak increase of the sp3/sp2 carbon bond ratio with HIPIMS pulse length. Studies of the shape and dimensions of copper nanoclusters performed by He ion microscopy have shown that increase of the HIPIMS pulse on time resulted in increased number of the nanoclusters and subsequent increase of the Cu nanoclusters size. Study of optical properties revealed surface plasmon resonance effect in all investigated films. Correlation between the optical absorption spectra and photoexcited charge carrier relaxation time recorded by the pump probe spectroscopy was found. The highest relaxation time was observed at the excitation wavelength close to the absorption surface plasmon resonance peak wavelength The highest maximum relaxation time was observed for the DLC:Cu film deposited by using HIPIMS pulse of 400 μs on time. It was explained by the dependence of the relaxation time on Cu nanocluster size.
关键词： Pulse length,Diamond-like carbon,High-power pulsed magnetron sputtering,Structure,Optical properties,X-ray photoelectron spectroscopy,Copper,Nanoclusters
更新于2025-09-23 15:23:52
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Preparation of multicomponent thin films by magnetron co-sputtering method: The Cu-Ti case study
摘要： The paper discusses the preparation of multicomponent thin films of Cu-Ti composite with desired elemental composition using the pulsed magnetron co-sputtering technology. The technological goal described in the paper was deposition the Cu-Ti composite with elemental ratio of about 50/50 at.%, which is close to the eutectic point from the Cu-Ti alloy system. A large difference in the sputtering yield (about seven-fold) of Cu and Ti metals was challenging, because of the features of used power supplies. Desired concentrations of the Ti and Cu elements were obtained as a result of application of multimagnetron sputtering system, where magnetrons were equipped with the Ti or Cu targets. Additionally, pulse power supply was used together with the pulse width modulation controller. Moreover, the article presents investigations of structural and mechanical properties of deposited Cu, Ti and Cu-Ti films with elemental composition of ca. 50/50 at.%. It was found that the two component Cu0.5Ti0.5 thin films were composed of Cu4Ti3 nanocrystallites built-in an amorphous matrix. As compared to the pure Cu and Ti thin films, the prepared composite exhibited improved hardness and better elasticity reflected in lower values of the Young’s modulus. The results of nanoindentation investigations showed that the Cu0.5Ti0.5 composite thin film was characterized by the hardness of 7.59 GPa.
关键词： thin film,CuTi alloy,multicomponent coating,magnetron sputtering
更新于2025-09-23 15:23:52